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Atomic Layer Deposition of Insulating Hafnium and Zirconium Nitrides

https://doi.org/10.1021/cm049516y
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What this work says

Outgoing claims: the papers this work cites, builds on, or argues with.

inferredcites →https://doi.org/10.1007/bf00722192openalex-snapshot
Properties of ZrN x prepared by ion-assisted deposition
inferredcites →https://doi.org/10.1016/s0040-6090(98)01058-xopenalex-snapshot
Electronic structure and chemical characterization of ultrathin insulating films
inferredcites →https://doi.org/10.1016/s0257-8972(99)00607-6openalex-snapshot
Production of stable and metastable phases of zirconium nitrides by NH3 plasma nitridation and by double ion beam sputtering of zirconium films
inferredcites →https://doi.org/10.1021/cm00018a034openalex-snapshot
Chemical vapor deposition of titanium, zirconium, and hafnium nitride thin films
inferredcites →https://doi.org/10.1021/cm020357xopenalex-snapshot
Atomic Layer Deposition of Hafnium and Zirconium Oxides Using Metal Amide Precursors
inferredcites →https://doi.org/10.1038/nmat836openalex-snapshot
Synthesis of cubic zirconium and hafnium nitride having Th3P4 structure
inferredcites →https://doi.org/10.1039/j19690000980openalex-snapshot
Metallo-organic compounds containing metal–nitrogen bonds. Part VI. Infrared and nuclear magnetic resonance of dialkylamidoderivatives of titanium, vanadium, zirconium, niobium, hafnium, tantalum, and thorium
inferredcites →https://doi.org/10.1039/jr9600003857openalex-snapshot
765. Metallo-organic compounds containing metal–nitrogen bonds. Part I. Some dialkylamino-derivatives of titanium and zirconium
inferredcites →https://doi.org/10.1063/1.97131openalex-snapshot
Stability of nitrogen-rich titanium nitride and zirconium nitride films
inferredcites →https://doi.org/10.1103/physrevb.47.1613openalex-snapshot
Electronic structure of insulating zirconium nitride
inferredcites →https://doi.org/10.1116/1.573933openalex-snapshot
Reactive radio frequency sputter deposition of higher nitrides of titanium, zirconium, and hafnium
inferredcites →https://doi.org/10.1116/1.574950openalex-snapshot
A study of nitrogen-rich titanium and zirconium nitride films
inferredcites →https://doi.org/10.1557/jmr.1986.0442openalex-snapshot
Higher nitrides of hafnium, zirconium, and titanium synthesized by dual ion beam deposition
inferredcites →https://doi.org/10.1557/proc-410-289openalex-snapshot
Plasma Enhanced Chemical Vapor Deposition of Zirconium Nitride Thin Films

What points at this work

Incoming claims: where this work appears in other papers’ reference lists and arguments.

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A revisit to atomic layer deposition of zinc oxide using diethylzinc and water as precursors
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New High-K Materials for CMOS Applications
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Self-limiting atomic layer deposition of conformal nanostructured silver films
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Improving stability of ALD ZrN thin film coatings over U-Mo dispersion fuel
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Energy-enhanced atomic layer deposition for more process and precursor versatility
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Kinetics and mechanism of mechanochemical synthesis of hafnium nitride ceramics in a planetary ball mill
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Atomic layer deposition of hafnium nitrides using ammonia and alkylamide precursors
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Synthesis of vanadium dioxide thin films on conducting oxides and metal–insulator transition characteristics
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Phase transformations and microstructural features in hafnium nitrides
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Mechanistic details of atomic layer deposition (ALD) processes for metal nitride film growth
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High-K materials and metal gates for CMOS applications
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Innovative process to obtain thin films and micro-nanostructured ZrN films from a photo-structurable ZrO2 sol-gel using rapid thermal nitridation
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Atomic layer deposition of high-k dielectrics on III–V semiconductor surfaces
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Reactivity of ZrCl4 and HfCl4 with silylamines and thermal decomposition of the compounds [MCl4{NH(R)(SiR′3)}] (M=Zr, Hf, R=tBu, R′=Me; R=SiR′3=SiMe3, SiMe2H)
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Understanding Selectivity Loss Mechanisms in Selective Material Deposition by Area Deactivation on 10 nm Cu/SiO2 Patterns
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Molecular Layer Deposition of Organic–Inorganic Hafnium Oxynitride Hybrid Films for Electrochemical Applications
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Plasma-Enhanced Atomic Layer Deposition of SiN–AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
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Ionic Liquid-Mediated Route to Atomic Layer Deposition of Tin(II) Oxide via a C–C Bond Cleavage Ligand Modification Mechanism
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Surface Transamination Reaction for Tetrakis(dimethylamido)titanium with NHX-Terminated Si(100) Surfaces
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Crystallinity-Controlled Synthesis of Zirconium Oxide Thin Films on Nitrogen-Doped Carbon Nanotubes by Atomic Layer Deposition
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Thermal Chemistry of Tetrakis(ethylmethylamido)titanium on Si(100) Surfaces
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Low-Temperature Roll-to-Roll Atmospheric Atomic Layer Deposition of Al2O3 Thin Films
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Utilization of a Buffered Dielectric to Achieve High Field-Effect Carrier Mobility in Graphene Transistors
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Synthesis of Zirconium Guanidinate Complexes and the Formation of Zirconium Carbonitride via Low Pressure CVD
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Thin films of hard cubic Zr3N4 stabilized by stress
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The surface chemistry of thin film atomic layer deposition (ALD) processes for electronic device manufacturing
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First principles high throughput screening of oxynitrides for water-splitting photocatalysts
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A cobalt( ii )heteroarylalkenolate precursor for homogeneous Co 3 O 4 coatings by atomic layer deposition
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Low resistivity HfN x grown by plasma-assisted ALD with external rf substrate biasing
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Ammonolysis synthesis of nickel molybdenum nitride nanostructures for high-performance asymmetric supercapacitors
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Potential of MISFET with HfN gate dielectric formed by ECR plasma sputtering
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Surface chemistry of atomic layer deposition: A case study for the trimethylaluminum/water process
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Atomic layer deposition of insulating nitride interfacial layers for germanium metal oxide semiconductor field effect transistors with high-κ oxide/tungsten nitride gate stacks
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As-deposited ferroelectric HZO on a III–V semiconductor
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Multistep atomic layer deposition process for ultrathin superconducting NbN films with high critical current density on amorphous substrate
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Optical properties of a HfO2/Si stack with a trace amount of nitrogen incorporation
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Dielectric properties of noncrystalline HfSiON
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Epitaxial cubic HfN diffusion barriers deposited on Si (001) by using a TiN buffer layer
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Competing reactions during metalorganic deposition: Ligand-exchange versus direct reaction with the substrate surface
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Development of ALD precursors for low resistivity Zr, Hf, and Nb nitride films
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Micro-nanostructuring by optical-lithography and nitriding of photo-patternable ZrO2 sol-gel to obtain micro-nanostructured ZrN
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Sidewall Passivation of Alxga1−Xas Homojunctions with Wet Chemicals and Field-Effect Passivation by Ald Oxides and Nitrides
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