On the public citation graph
Atomic Layer Deposition of Hafnium Oxide from Hafnium Chloride and Water
0 signed · 96 inferred · view as graph
Inferred edges come from two machine sources: sweeps of open repository metadata (mostly SSRN and Zenodo), and a bulk OpenAlex citation snapshot. Every row below is labelled with the one it came from. Neither is a complete citation index — absence here is not evidence of absence.
Is this your work? Sign in with ORCID and put your name on the
claims that are yours.
Reference health. See whether every reference in this work resolves to a
known work and none has been retracted — and get a dated CiteStamped
badge you can embed.
What this work says
Outgoing claims: the papers this work cites, builds on, or argues with.
inferredcites →https://doi.org/10.1002/aic.10148openalex-snapshot
Susceptibility of SiO 2 , ZrO 2 , and HfO 2 dielectrics to moisture contamination
inferredcites →https://doi.org/10.1016/0039-6028(96)00592-4openalex-snapshot
Adsorption and desorption kinetics of H2O on a fully hydroxylated SiO2 surface
inferredcites →https://doi.org/10.1016/0040-6090(94)90168-6openalex-snapshot
Development of crystallinity and morphology in hafnium dioxide thin films grown by atomic layer epitaxy
inferredcites →https://doi.org/10.1016/0927-0256(96)00008-0openalex-snapshot
Efficiency of ab-initio total energy calculations for metals and semiconductors using a plane-wave basis set
inferredcites →https://doi.org/10.1016/j.cplett.2006.01.057openalex-snapshot
Non-growth ligand exchange reactions in atomic layer deposition of HfO2
inferredcites →https://doi.org/10.1016/j.susc.2003.10.056openalex-snapshot
Mechanism and kinetics of thin zirconium and hafnium oxide film growth in an ALD reactor
inferredcites →https://doi.org/10.1016/j.tsf.2004.01.110openalex-snapshot
Optical characterization of HfO2 thin films grown by atomic layer deposition
inferredcites →https://doi.org/10.1016/s0022-0248(00)00831-9openalex-snapshot
Texture development in nanocrystalline hafnium dioxide thin films grown by atomic layer deposition
inferredcites →https://doi.org/10.1016/s0040-6090(00)00890-7openalex-snapshot
Effect of water dose on the atomic layer deposition rate of oxide thin films
inferredcites →https://doi.org/10.1016/s0040-6090(02)00612-0openalex-snapshot
Comparison of hafnium oxide films grown by atomic layer deposition from iodide and chloride precursors
inferredcites →https://doi.org/10.1016/s0040-6090(98)01356-xopenalex-snapshot
Influence of substrate temperature on atomic layer growth and properties of HfO2 thin films
inferredcites →https://doi.org/10.1016/s0167-2738(01)00826-8openalex-snapshot
Characterization of adsorbed water layers on Y2O3-doped ZrO2
inferredcites →https://doi.org/10.1016/s0927-0256(02)00428-7openalex-snapshot
DFT investigation of HfCl 4 decomposition on hydroxylated SiO 2 : first stage of HfO 2 atomic layer deposition
inferredcites →https://doi.org/10.1021/cm060679ropenalex-snapshot
First-Principles Investigation of Hydroxylated Monoclinic HfO2 Surfaces
inferredcites →https://doi.org/10.1021/ie060475kopenalex-snapshot
Mechanism and Kinetics of Nonequilibrium and Multilayer Adsorption and Desorption of Gases on Solids
inferredcites →https://doi.org/10.1021/j100067a020openalex-snapshot
Thermodynamics of Proton Binding at the Alumina/Aqueous Solution Interface. A Phenomenological Approach
inferredcites →https://doi.org/10.1021/j100721a039openalex-snapshot
Relation between the amounts of chemisorbed and physisorbed water on metal oxides
inferredcites →https://doi.org/10.1021/j150626a034openalex-snapshot
Temperature programmed desorption study of water adsorbed on metal oxides. 2. Tin oxide surfaces
inferredcites →https://doi.org/10.1021/ja066529zopenalex-snapshot
Atomic Layer Deposition of TiO2 from TiI4 and H2O onto SiO2 Surfaces: Ab Initio Calculations of the Initial Reaction Mechanisms
inferredcites →https://doi.org/10.1021/jp047514vopenalex-snapshot
Infrared Spectra of Hydrogen-Bonded Ionic Crystals: Ab Initio Study of Mg(OH)2 and β-Be(OH)2
inferredcites →https://doi.org/10.1021/jp048663gopenalex-snapshot
Hafnium Oxide and Zirconium Oxide Atomic Layer Deposition: Initial Precursor and Potential Side-Reaction Product Pathways with H/Si(100)-2×1
inferredcites →https://doi.org/10.1038/35023243openalex-snapshot
Alternative dielectrics to silicon dioxide for memory and logic devices
inferredcites →https://doi.org/10.1063/1.1323224openalex-snapshot
Improved tangent estimate in the nudged elastic band method for finding minimum energy paths and saddle points
inferredcites →https://doi.org/10.1063/1.1329672openalex-snapshot
A climbing image nudged elastic band method for finding saddle points and minimum energy paths
inferredcites →https://doi.org/10.1063/1.1487923openalex-snapshot
Thermal stability and structural characteristics of HfO2 films on Si (100) grown by atomic-layer deposition
inferredcites →https://doi.org/10.1063/1.1495847openalex-snapshot
Atomic layer deposition of hafnium oxide: A detailed reaction mechanism from first principles
inferredcites →https://doi.org/10.1063/1.1587261openalex-snapshot
Density functional theory study of HfCl4, ZrCl4, and Al(CH3)3 decomposition on hydroxylated SiO2: Initial stage of high-k atomic layer deposition
inferredcites →https://doi.org/10.1063/1.1599978openalex-snapshot
Mathematical description of atomic layer deposition and its application to the nucleation and growth of HfO2 gate dielectric layers
inferredcites →https://doi.org/10.1063/1.1689732openalex-snapshot
Analysis of hydroxyl group controlled atomic layer deposition of hafnium dioxide from hafnium tetrachloride and water
inferredcites →https://doi.org/10.1063/1.1796513openalex-snapshot
Effect of selected atomic layer deposition parameters on the structure and dielectric properties of hafnium oxide films
inferredcites →https://doi.org/10.1093/oso/9780198551669.003.0001openalex-snapshot
Electronic Structure of Solids
inferredcites →https://doi.org/10.1103/physrevb.31.1770openalex-snapshot
Simplified method for calculating the energy of weakly interacting fragments
inferredcites →https://doi.org/10.1103/physrevb.46.6671openalex-snapshot
Atoms, molecules, solids, and surfaces: Applications of the generalized gradient approximation for exchange and correlation
inferredcites →https://doi.org/10.1103/physrevb.47.558openalex-snapshot
Ab initio molecular dynamics for liquid metals
inferredcites →https://doi.org/10.1103/physrevb.48.4978.2openalex-snapshot
Erratum: Atoms, molecules, solids, and surfaces: Applications of the generalized gradient approximation for exchange and correlation
inferredcites →https://doi.org/10.1103/physrevb.50.17953openalex-snapshot
Projector augmented-wave method
inferredcites →https://doi.org/10.1103/physrevb.73.115330openalex-snapshot
First-principles calculations of structural and electronic properties of monoclinic hafnia surfaces
inferredcites →https://doi.org/10.1126/science.288.5464.319openalex-snapshot
Atomic Layer Deposition of Oxide Thin Films with Metal Alkoxides as Oxygen Sources
inferredcites →https://doi.org/10.1364/ao.28.002806openalex-snapshot
Deposition of optical thin films by pulsed laser assisted evaporation
What points at this work
Incoming claims: where this work appears in other papers’ reference lists and arguments.
inferred← citeshttps://doi.org/10.2139/ssrn.4823793openalex-extracted
Amidoxime-Containing Zr and Hf Precursors for Thin Film Deposition
inferred← citeshttps://doi.org/10.1002/9783527639915.ch1openalex-snapshot
Theoretical Modeling of ALD Processes
inferred← citeshttps://doi.org/10.1002/adfm.200902236openalex-snapshot
Interface Engineering for Organic Electronics
inferred← citeshttps://doi.org/10.1007/978-981-96-0247-6_9openalex-snapshot
TMDs Research with Atomic Layer Deposition (ALD) Technique
inferred← citeshttps://doi.org/10.1016/j.apcatb.2022.122177openalex-snapshot
Photocatalytic conversion of CO2 to acetic acid by CuPt/WO3: Chloride enhanced C-C coupling mechanism
inferred← citeshttps://doi.org/10.1016/j.apsusc.2022.153516openalex-snapshot
Design and self-catalytic mechanism of aluminum precursors bearing amino ligands for Al2S3 atomic layer deposition
inferred← citeshttps://doi.org/10.1016/j.apsusc.2024.159728openalex-snapshot
Precursor design and cascade mechanism of RuO2·xH2O atomic layer deposition
inferred← citeshttps://doi.org/10.1016/j.apsusc.2026.166554openalex-snapshot
First-principles mechanism of TDMAH adsorption on pristine and laser-functionalized graphene toward area-selective atomic layer deposition of HfO2
inferred← citeshttps://doi.org/10.1016/j.ccr.2013.04.006openalex-snapshot
Mechanisms of surface reactions in thin solid film chemical deposition processes
inferred← citeshttps://doi.org/10.1016/j.colsurfa.2025.137452openalex-snapshot
Chemical kinetic equations for describing the process of atomic layer deposition with analytical solution
inferred← citeshttps://doi.org/10.1016/j.compositesb.2019.01.094openalex-snapshot
Central composite design (CCD)-Response surface methodology (RSM) of effective electrospinning parameters on PVP-B-Hf hybrid nanofibrous composites for synthesis of HfB2-based composite nanofibers
inferred← citeshttps://doi.org/10.1016/j.jmst.2026.07.068openalex-snapshot
Interface-mediated hydrogen permeation resistance in Al2O3/TiO2 nano-multilayer coatings: The roles of period thickness and defect segregation
inferred← citeshttps://doi.org/10.1016/j.mtcomm.2022.105061openalex-snapshot
Atomic/molecular layer deposition mechanism of alucone organic–inorganic hybrid materials
inferred← citeshttps://doi.org/10.1016/j.mtener.2023.101457openalex-snapshot
Atomic layer deposition of piezoelectric materials: a timely review
inferred← citeshttps://doi.org/10.1016/j.surfcoat.2018.02.082openalex-snapshot
Hydrogen plasma-enhanced atomic layer deposition of hydrogenated amorphous carbon thin films
inferred← citeshttps://doi.org/10.1016/j.surfin.2022.102579openalex-snapshot
Surface reaction mechanism of atomic layer deposition of titanium nitride using Tetrakis(dimethylamino)titanium and ammonia
inferred← citeshttps://doi.org/10.1016/j.surfin.2023.103766openalex-snapshot
Atomic layer deposition mechanism of hafnium dioxide using hafnium precursor with amino ligands and water
inferred← citeshttps://doi.org/10.1016/j.susc.2015.07.012openalex-snapshot
Adsorption of prototypical amino acids on silica: Influence of the pre-adsorbed water multilayer
inferred← citeshttps://doi.org/10.1016/j.susc.2024.122580openalex-snapshot
H2O-based atomic layer deposition mechanism of aluminum oxide using trimethylaluminum
inferred← citeshttps://doi.org/10.1021/acs.chemmater.5b04422openalex-snapshot
Theoretical Understanding of the Reaction Mechanism of SiO2 Atomic Layer Deposition
inferred← citeshttps://doi.org/10.1021/acs.inorgchem.1c02339openalex-snapshot
Group IV Transition Metal (M = Zr, Hf) Precursors for High-κ Metal Oxide Thin Films
inferred← citeshttps://doi.org/10.1021/acs.jpcc.5b05286openalex-snapshot
Effects of Cl-Based Ligand Structures on Atomic Layer Deposited HfO2
inferred← citeshttps://doi.org/10.1021/acs.jpcc.7b11469openalex-snapshot
Atomic Layer Deposition of Zinc Oxide: Study on the Water Pulse Reactions from First-Principles
inferred← citeshttps://doi.org/10.1021/acs.langmuir.5c05147openalex-snapshot
Anhydrous Atomic Layer Deposition of HfO 2 : Mechanistic Analysis of the Tetrakis(dimethylamido)hafnium (TDMAH)–O 2 Process
inferred← citeshttps://doi.org/10.1021/acsami.5b07887openalex-snapshot
Mechanisms of LiCoO 2 Cathode Degradation by Reaction with HF and Protection by Thin Oxide Coatings
inferred← citeshttps://doi.org/10.1021/cm3001199openalex-snapshot
Stabilization of Tetragonal HfO2 under Low Active Oxygen Source Environment in Atomic Layer Deposition
inferred← citeshttps://doi.org/10.1021/cm303630eopenalex-snapshot
Multiple Proton Diffusion and Film Densification in Atomic Layer Deposition Modeled by Density Functional Theory
inferred← citeshttps://doi.org/10.1021/jp2011827openalex-snapshot
Atomic Layer Deposition of Aluminum Oxide on TiO2 and Its Impact on N3 Dye Adsorption from First Principles
inferred← citeshttps://doi.org/10.1021/jp309974ropenalex-snapshot
Surface Pseudorotation in Lewis-Base-Catalyzed Atomic Layer Deposition of SiO2: Static Transition State Search and Born–Oppenheimer Molecular Dynamics Simulation
inferred← citeshttps://doi.org/10.1021/jp4128258openalex-snapshot
Reactions of Atomic Hydrogen with the Hydroxide- and Amine-Functionalized Si(100)-2×1 Surfaces: Accurate Modeling of Hydrogen Abstraction Reactions Using Density Functional Theory
inferred← citeshttps://doi.org/10.1039/9781782626947-00119openalex-snapshot
Self-Assembled Mono- and Multilayers for Functional Opto-Electronic Devices
inferred← citeshttps://doi.org/10.1039/b909484aopenalex-snapshot
π-σ-Phosphonic acid organic monolayer–amorphous sol–gel hafnium oxide hybrid dielectric for low-voltage organic transistors on plastic
inferred← citeshttps://doi.org/10.1039/c1jm11511aopenalex-snapshot
Three growth modes and mechanisms for highly structure-tunable SnO2 nanotube arrays of template-directed atomic layer deposition
inferred← citeshttps://doi.org/10.1039/c4cy00632aopenalex-snapshot
Structure–activity relationships on metal-oxides: alcohol dehydration
inferred← citeshttps://doi.org/10.1039/c5cp01912eopenalex-snapshot
First principles study of the atomic layer deposition of alumina by TMA–H 2 O-process
inferred← citeshttps://doi.org/10.1039/c5nr00900fopenalex-snapshot
Cooperation between adsorbates accounts for the activation of atomic layer deposition reactions
inferred← citeshttps://doi.org/10.1039/c8tc01476kopenalex-snapshot
Comparative study of the growth characteristics and electrical properties of atomic-layer-deposited HfO 2 films obtained from metal halide and amide precursors
inferred← citeshttps://doi.org/10.1039/d1cp00864aopenalex-snapshot
Reaction mechanism of atomic layer deposition of aluminum sulfide using trimethylaluminum and hydrogen sulfide
inferred← citeshttps://doi.org/10.1039/d1nr05250kopenalex-snapshot
Transition-metal nitride halide dielectrics for transition-metal dichalcogenide transistors
inferred← citeshttps://doi.org/10.1039/d2ra01573kopenalex-snapshot
High-throughput growth of HfO 2 films using temperature-gradient laser chemical vapor deposition
inferred← citeshttps://doi.org/10.1063/1.3254385openalex-snapshot
First-principles molecular dynamics simulations at solid-liquid interfaces with a continuum solvent
inferred← citeshttps://doi.org/10.1063/1.4942439openalex-snapshot
AxBAxB… pulsed atomic layer deposition: Numerical growth model and experiments
inferred← citeshttps://doi.org/10.1063/5.0213731openalex-snapshot
Stabilizing perpendicular magnetic anisotropy with strong exchange bias in PtMn/Co by magneto-ionics
inferred← citeshttps://doi.org/10.1080/15321819.2018.1517090openalex-snapshot
Use of hafnium(IV) oxide in biosensors
inferred← citeshttps://doi.org/10.1088/0268-1242/27/7/074008openalex-snapshot
Atomic-scale simulation of ALD chemistry
inferred← citeshttps://doi.org/10.1103/why6-1fl8openalex-snapshot
Shubnikov–de Haas oscillations reaching the quantum limit in two-dimensional electron systems at SrTi O 3 (111) interfaces
inferred← citeshttps://doi.org/10.1111/ijac.13532openalex-snapshot
A different chemical route to prepare hafnium diboride‐based nanofibers: Effect of chemical composition
inferred← citeshttps://doi.org/10.1116/6.0000796openalex-snapshot
Surface reaction of the hafnium precursor with a linked amido-cyclopentadienyl ligand: A density functional theory study
inferred← citeshttps://doi.org/10.1149/1.3186020openalex-snapshot
Growth and Material Characterization of Hafnium Titanates Deposited by Atomic Layer Deposition
inferred← citeshttps://doi.org/10.1186/s11671-014-0714-1openalex-snapshot
Stepwise mechanism and H2O-assisted hydrolysis in atomic layer deposition of SiO2 without a catalyst
inferred← citeshttps://doi.org/10.21203/rs.3.rs-1127423/v1openalex-snapshot
High-Throughput Growth of HfO2 Films Using Temperature-gradient Laser Chemical Vapor Deposition
inferred← citeshttps://doi.org/10.31315/e.v17i2.3714openalex-snapshot
The Growth Mechanisms of Atomic Layer Deposition: An Overview
inferred← citeshttps://doi.org/10.3389/fchem.2022.1035902openalex-snapshot
Reaction mechanism of atomic layer deposition of zirconium oxide using zirconium precursors bearing amino ligands and water
inferred← citeshttps://doi.org/10.3390/nano12050831openalex-snapshot
Recent Advances in Theoretical Development of Thermal Atomic Layer Deposition: A Review
inferred← citeshttps://doi.org/10.70675/e59d0046z5501z4ff9zadeez24f28fbb0b8copenalex-snapshot
Magnéto-ionique dans les systèmes basés sur CoFeB
Editorial review for independent work. ICSAC — the Institute for Complexity
Science and Advanced Computing — runs a structured editorial panel for researchers
publishing outside journals, and publishes on CiteStamp rails. Submission is free
and goes through ORCID: icsacinstitute.org/submit.