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Amidoxime-Containing Zr and Hf Precursors for Thin Film Deposition

https://doi.org/10.2139/ssrn.4823793
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inferredcites →https://doi.org/10.1002/1521-3862(20020704)8:4<163::aid-cvde163>3.0.co;2-vopenalex-extracted
Novel Mononuclear Alkoxide Precursors for the MOCVD of ZrO2 and HfO2 Thin Films
inferredcites →https://doi.org/10.1002/1521-3862(20020903)8:5<199::aid-cvde199>3.0.co;2-uopenalex-extracted
Atomic Layer Deposition of Hafnium Dioxide Films from Hafnium Tetrakis(ethylmethylamide) and Water
inferredcites →https://doi.org/10.1002/cvde.200306263openalex-extracted
Atomic Layer Deposition of Hafnium Dioxide Films Using Hafnium Bis(2‐butanolate)bis(1‐methoxy‐2‐methyl‐2‐propanolate) and Water
inferredcites →https://doi.org/10.1002/cvde.200500023openalex-extracted
MOCVD and ALD of High‐k Dielectric Oxides Using Alkoxide Precursors
inferredcites →https://doi.org/10.1002/cvde.200806716openalex-extracted
The Atomic Layer Deposition of HfO2 and ZrO2 using Advanced Metallocene Precursors and H2O as the Oxygen Source
inferredcites →https://doi.org/10.1016/j.apsusc.2013.12.061openalex-extracted
Chemical structures and electrical properties of atomic layer deposited HfO2 thin films grown at an extremely low temperature (≤100°C) using O3 as an oxygen source
inferredcites →https://doi.org/10.1016/j.apsusc.2016.03.064openalex-extracted
Development of a flexible nanocomposite TiO2 film as a protective coating for bioapplications of superelastic NiTi alloys
inferredcites →https://doi.org/10.1016/j.jcrysgro.2009.10.028openalex-extracted
Growth and phase stabilization of HfO2 thin films by ALD using novel precursors
inferredcites →https://doi.org/10.1016/j.jece.2019.103096openalex-extracted
Synthesis of porous TiO2/ZrO2 photocatalyst derived from zirconium metal organic framework for degradation of organic pollutants under visible light irradiation
inferredcites →https://doi.org/10.1016/j.matlet.2014.04.026openalex-extracted
Photovoltaic properties of TiO2–ZrO2 fiber composite electrodes for dye-sensitized solar cells
inferredcites →https://doi.org/10.1016/j.tsf.2005.05.050openalex-extracted
Atomic layer deposition of hafnium dioxide thin films from hafnium tetrakis(dimethylamide) and water
inferredcites →https://doi.org/10.1016/j.tsf.2009.09.165openalex-extracted
Role of high-k gate insulators for oxide thin film transistors
inferredcites →https://doi.org/10.1016/j.tsf.2012.07.037openalex-extracted
Optical properties of HfO2 thin films deposited by magnetron sputtering: From the visible to the far-infrared
inferredcites →https://doi.org/10.1016/s0040-6090(02)00612-0openalex-extracted
Comparison of hafnium oxide films grown by atomic layer deposition from iodide and chloride precursors
inferredcites →https://doi.org/10.1016/s0040-6090(02)01198-7openalex-extracted
Interface properties of ultra-thin HfO2 films grown by atomic layer deposition on SiO2/Si
inferredcites →https://doi.org/10.1021/acs.langmuir.6b03119openalex-extracted
Atomic Layer Deposition for Coating of High Aspect Ratio TiO2 Nanotube Layers
inferredcites →https://doi.org/10.1021/cm020357xopenalex-extracted
Atomic Layer Deposition of Hafnium and Zirconium Oxides Using Metal Amide Precursors
inferredcites →https://doi.org/10.1021/cm021328popenalex-extracted
Atomic Layer Deposition of Hafnium Dioxide Films from 1-Methoxy-2-methyl-2-propanolate Complex of Hafnium
inferredcites →https://doi.org/10.1021/ja801616uopenalex-extracted
Atomic Layer Deposition of Hafnium Oxide from Hafnium Chloride and Water
inferredcites →https://doi.org/10.1039/b417866copenalex-extracted
Controlled growth of HfO2 thin films by atomic layer deposition from cyclopentadienyl-type precursor and water
inferredcites →https://doi.org/10.1039/c1dt10448aopenalex-extracted
Intermolecular hydroamination of oxygen-substituted allenes. New routes for the synthesis of N,O-chelated zirconium and titanium amido complexes
inferredcites →https://doi.org/10.1063/1.1506207openalex-extracted
Dielectric property and thermal stability of HfO2 on silicon
inferredcites →https://doi.org/10.1063/1.1599980openalex-extracted
Comparison of HfO2 films grown by atomic layer deposition using HfCl4 and H2O or O3 as the oxidant
inferredcites →https://doi.org/10.1116/1.1761186openalex-extracted
Atomic layer deposition of hafnium oxide and hafnium silicate thin films using liquid precursors and ozone
inferredcites →https://doi.org/10.1149/1.1701587openalex-extracted
Thermally Evaporated ZrO[sub 2]
inferredcites →https://doi.org/10.1149/1.1770934openalex-extracted
Properties of HfO[sub 2] Thin Films Grown by ALD from Hafnium tetrakis(ethylmethylamide) and Water
inferredcites →https://doi.org/10.1149/1.1884130openalex-extracted
Comparison of Properties of an Al[sub 2]O[sub 3] Thin Layers Grown with Remote O[sub 2] Plasma, H[sub 2]O, or O[sub 3] as Oxidants in an ALD Process for HfO[sub 2] Gate Dielectrics
inferredcites →https://doi.org/10.1149/1.2162447openalex-extracted
HfO[sub 2] Films Grown by ALD Using Cyclopentadienyl-Type Precursors and H[sub 2]O or O[sub 3] as Oxygen Source
inferredcites →https://doi.org/10.1149/1.3205070openalex-extracted
Detailed Correlation of Electrical and Breakdown Characteristics to the Structural Properties of ALD Grown HfO2- and ZrO2-based Capacitor Dielectrics
inferredcites →https://doi.org/10.14704/nq.2020.18.3.nq20146openalex-extracted
Structural, Optical, Electrical and Gas Sensor Properties of ZrO2 Thin Films prepared by Sol-Gel Technique
inferredcites →https://doi.org/10.3390/mi10060361openalex-extracted
Characterization of Al Incorporation into HfO2 Dielectric by Atomic Layer Deposition
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