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High dielectric constant TiO2 thin films on a Ru electrode grown at 250 °C by atomic-layer deposition

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Outgoing claims: the papers this work cites, builds on, or argues with.

inferredcites →https://doi.org/10.1016/s0040-6090(02)01105-7openalex-snapshot
Rutile-type TiO2 thin film for high-k gate insulator
inferredcites →https://doi.org/10.1016/s0167-5729(02)00100-0openalex-snapshot
The surface science of titanium dioxide
inferredcites →https://doi.org/10.1016/s0169-4332(01)00430-5openalex-snapshot
Influence of structure development on atomic layer deposition of TiO2 thin films
inferredcites →https://doi.org/10.1063/1.114795openalex-snapshot
Deposition of extremely thin (Ba,Sr)TiO3 thin films for ultra-large-scale integrated dynamic random access memory application
inferredcites →https://doi.org/10.1063/1.1483105openalex-snapshot
Thickness-dependent dielectric constants of (Ba,Sr)TiO3 thin films with Pt or conducting oxide electrodes
inferredcites →https://doi.org/10.1116/1.589214openalex-snapshot
Structural and electrical characterization of TiO2 grown from titanium tetrakis-isopropoxide (TTIP) and TTIP/H2O ambients
inferredcites →https://doi.org/10.1149/1.1471547openalex-snapshot
Metallorganic Chemical Vapor Deposition of Ru Films Using Cyclopentadienyl-Propylcyclopentadienylruthenium(II) and Oxygen
inferredcites →https://doi.org/10.1149/1.1506305openalex-snapshot
Cation Composition Control of MOCVD (Ba,Sr)TiO[sub 3] Thin Films along the Capacitor Hole

What points at this work

Incoming claims: where this work appears in other papers’ reference lists and arguments.

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Interfaces in Atomic Layer Deposited Films: Opportunities and Challenges
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Mass-Production Memories (DRAM and Flash)
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Optical Properties of TiO2 Films Deposited by Reactive Electron Beam Sputtering
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Hydrogen Plasma-Assisted Atomic Layer Deposition of Ru with Low Oxygen Content
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Atomic Layer Deposition for Surface Engineering of Solid Oxide Fuel Cell Electrodes
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Ionization potential and electron attenuation length of titanium dioxide deposited by atomic layer deposition determined by photoelectron spectroscopy in air
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Tailoring crystallisation of anatase TiO2 ultra-thin films grown by atomic layer deposition using 2D oxides as growth template
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Atomic layer deposition of conductive SnO2 thin films using Sn(dmamp)2 and H2O2 for templating rutile TiO2 growth
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Indirect Synthesis of Carbon-Free Perovskite SrTiO3 Thin Films via SrF2 and TiO2 ALD for DRAM Capacitors
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Atomic layer deposition of rutile-phase TiO2 on RuO2 from TiCl4 and O3: Growth of high-permittivity dielectrics with low leakage current
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Atomic layer deposition of TiO2 from TiCl4 and O3
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Ge incorporated epitaxy of (110) rutile TiO2 on (100) Ge single crystal at low temperature by pulsed laser deposition
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inferred← citeshttps://doi.org/10.1021/acs.jpcc.5b08699openalex-snapshot
Near Ambient Pressure X-ray Photoelectron Spectroscopy Study of the Atomic Layer Deposition of TiO2 on RuO2(110)
inferred← citeshttps://doi.org/10.1021/acs.jpcc.6b01687openalex-snapshot
Kinetic Monte Carlo Simulations of Defects in Anatase Titanium Dioxide
inferred← citeshttps://doi.org/10.1021/acs.jpcc.9b03727openalex-snapshot
Substrate Effects on the Growth Behavior of Atomic-Layer-Deposited Ru Thin Films Using RuO4 Precursor and N2/H2 Mixed Gas
inferred← citeshttps://doi.org/10.1021/acs.nanolett.2c00811openalex-snapshot
Advanced Atomic Layer Deposition: Ultrathin and Continuous Metal Thin Film Growth and Work Function Control Using the Discrete Feeding Method
inferred← citeshttps://doi.org/10.1021/acsaelm.4c00195openalex-snapshot
Suppressing Interfacial Layer Formation in ZrO2-Based Capacitors with TiN Electrodes via a MgO Thin-Film Oxygen Diffusion Barrier
inferred← citeshttps://doi.org/10.1021/acsaelm.5c02598openalex-snapshot
Beyond ZrO 2 : Rutile TiO 2 as the Dielectric Platform for Next-Generation DRAM Capacitors
inferred← citeshttps://doi.org/10.1021/acsaelm.6c00060openalex-snapshot
Al-Doped Rutile TiO 2 with Y 2 O 3 –ZrO 2 Stacks Achieving Thin Thickness and Low Leakage for Dynamic Random-Access Memory Capacitors
inferred← citeshttps://doi.org/10.1021/acsami.1c03795openalex-snapshot
Improved Properties of the Atomic Layer Deposited Ru Electrode for Dynamic Random-Access Memory Capacitor Using Discrete Feeding Method
inferred← citeshttps://doi.org/10.1021/acsami.4c06922openalex-snapshot
High-Performance TiO 2 /ZrO 2 /TiO 2 Thin Film Capacitor by Plasma-Assisted Atomic Layer Annealing
inferred← citeshttps://doi.org/10.1021/acsami.4c08379openalex-snapshot
Atomic Layer Growth of Rutile TiO2 Films with Ultrahigh Dielectric Constants via Crystal Orientation Engineering
inferred← citeshttps://doi.org/10.1021/acsami.5b06485openalex-snapshot
Structural and Dielectric Properties of Subnanometric Laminates of Binary Oxides
inferred← citeshttps://doi.org/10.1021/acsami.6b05700openalex-snapshot
Conformal BaTiO3Films with High Piezoelectric Coupling through an Optimized Hydrothermal Synthesis
inferred← citeshttps://doi.org/10.1021/acsenergylett.2c00392openalex-snapshot
Interfacial Dipole Layer Enables High-Performance Heterojunctions for Photoelectrochemical Water Splitting
inferred← citeshttps://doi.org/10.1021/am301094topenalex-snapshot
Impact of Bimetal Electrodes on Dielectric Properties of TiO 2 and Al-Doped TiO 2 Films
inferred← citeshttps://doi.org/10.1021/am4049139openalex-snapshot
Nanoscale Characterization of TiO2 Films Grown by Atomic Layer Deposition on RuO2 Electrodes
inferred← citeshttps://doi.org/10.1021/am501247uopenalex-snapshot
Controlling the Al-Doping Profile and Accompanying Electrical Properties of Rutile-Phased TiO2 Thin Films
inferred← citeshttps://doi.org/10.1021/am506677eopenalex-snapshot
Evaluating the Top Electrode Material for Achieving an Equivalent Oxide Thickness Smaller than 0.4 nm from an Al-Doped TiO 2 Film
inferred← citeshttps://doi.org/10.1021/am5072223openalex-snapshot
Atomic Layer Deposition of Undoped TiO2 Exhibiting p-Type Conductivity
inferred← citeshttps://doi.org/10.1021/cm100057yopenalex-snapshot
Investigation on the Growth Initiation of Ru Thin Films by Atomic Layer Deposition
inferred← citeshttps://doi.org/10.1021/cm1010289openalex-snapshot
Permittivity Enhanced Atomic Layer Deposited HfO2 Thin Films Manipulated by a Rutile TiO2 Interlayer
inferred← citeshttps://doi.org/10.1021/cm1020959openalex-snapshot
Dopant Control by Atomic Layer Deposition in Oxide Films for Memristive Switches
inferred← citeshttps://doi.org/10.1021/cm1026128openalex-snapshot
Role of Interfacial Reaction in Atomic Layer Deposition of TiO2 Thin Films Using Ti(O-iPr)2(tmhd)2 on Ru or RuO2 Substrates
inferred← citeshttps://doi.org/10.1021/cm200989topenalex-snapshot
Study on Initial Growth Behavior of RuO2 Film Grown by Pulsed Chemical Vapor Deposition: Effects of Substrate and Reactant Feeding Time
inferred← citeshttps://doi.org/10.1021/cm2030735openalex-snapshot
Cycloheptatrienyl-Cyclopentadienyl Heteroleptic Precursors for Atomic Layer Deposition of Group 4 Oxide Thin Films
inferred← citeshttps://doi.org/10.1021/cm303268popenalex-snapshot
Functional Ultrathin Films and Nanolaminates from Aqueous Solutions
inferred← citeshttps://doi.org/10.1021/cm303703ropenalex-snapshot
Growth and Crystallization of TiO2 Thin Films by Atomic Layer Deposition Using a Novel Amido Guanidinate Titanium Source and Tetrakis-dimethylamido-titanium
inferred← citeshttps://doi.org/10.1021/cm5035485openalex-snapshot
Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Thin Films from a Zero-Valent (1,5-Hexadiene)(1-isopropyl-4-methylbenzene)ruthenium Complex and O2
inferred← citeshttps://doi.org/10.1021/cm800280topenalex-snapshot
Growth Behavior of Al-Doped TiO 2 Thin Films by Atomic Layer Deposition
inferred← citeshttps://doi.org/10.1021/cm802485ropenalex-snapshot
Chemical Vapor Deposition of Ru Thin Films with an Enhanced Morphology, Thermal Stability, and Electrical Properties Using a RuO4 Precursor
inferred← citeshttps://doi.org/10.1021/cr9001275openalex-snapshot
High-k Organic, Inorganic, and Hybrid Dielectrics for Low-Voltage Organic Field-Effect Transistors
inferred← citeshttps://doi.org/10.1021/ja511982nopenalex-snapshot
Electric Field Changes on Au Nanoparticles on Semiconductor Supports – The Molecular Voltmeter and Other Methods to Observe Adsorbate-Induced Charge-Transfer Effects in Au/TiO 2 Nanocatalysts
inferred← citeshttps://doi.org/10.1021/jp073429mopenalex-snapshot
Extraordinary Infrared Transmission Resonances of Metal Microarrays for Sensing Nanocoating Thickness
inferred← citeshttps://doi.org/10.1021/jp3094897openalex-snapshot
Femtosecond Time-Resolved Fluorescence Study of TiO2-Coated ZnO Nanorods/P3HT Photovoltaic Films
inferred← citeshttps://doi.org/10.1021/jp8028616openalex-snapshot
Surface Reaction Mechanisms during Ozone-Based Atomic Layer Deposition of Titanium Dioxide
inferred← citeshttps://doi.org/10.1021/jp8037363openalex-snapshot
Carboxylic Acids as Oxygen Sources for the Atomic Layer Deposition of High-κ Metal Oxides
inferred← citeshttps://doi.org/10.1021/jp9021882openalex-snapshot
Growth of Noble Metal Ru Thin Films by Liquid Injection Atomic Layer Deposition
inferred← citeshttps://doi.org/10.1021/jp903669copenalex-snapshot
Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
inferred← citeshttps://doi.org/10.1021/jp907940uopenalex-snapshot
Atomic Layer Deposition of Titanium Dioxide Thin Films from Cp*Ti(OMe)3 and Ozone
inferred← citeshttps://doi.org/10.1021/la500893uopenalex-snapshot
Atomic Layer Deposition, Characterization, and Growth Mechanistic Studies of TiO2 Thin Films
inferred← citeshttps://doi.org/10.1021/nn101453vopenalex-snapshot
Robust High-κ Response in Molecularly Thin Perovskite Nanosheets
inferred← citeshttps://doi.org/10.1021/nn900104uopenalex-snapshot
Construction of Highly Ordered Lamellar Nanostructures through Langmuir−Blodgett Deposition of Molecularly Thin Titania Nanosheets Tens of Micrometers Wide and Their Excellent Dielectric Properties
inferred← citeshttps://doi.org/10.1021/tx1001892openalex-snapshot
Titanium Oxide Shell Coatings Decrease the Cytotoxicity of ZnO Nanoparticles
inferred← citeshttps://doi.org/10.1038/s41467-022-29405-2openalex-snapshot
Open-channel microfluidics via resonant wireless power transfer
inferred← citeshttps://doi.org/10.1038/s41598-019-47710-7openalex-snapshot
Stability of non-metal dopants to tune the photo-absorption of TiO2 at realistic temperatures and oxygen partial pressures: A hybrid DFT study
inferred← citeshttps://doi.org/10.1038/s41598-020-72195-0openalex-snapshot
Theoretical insights of codoping to modulate electronic structure of $$\hbox {TiO}_2$$ and $$\hbox {SrTiO}_3$$ for enhanced photocatalytic efficiency
inferred← citeshttps://doi.org/10.1038/srep08561openalex-snapshot
A hybrid electro-optic polymer and TiO2 double-slot waveguide modulator
inferred← citeshttps://doi.org/10.1039/b809953gopenalex-snapshot
Atomic layer deposition of photocatalytic TiO2 thin films from TiF4 and H2O
inferred← citeshttps://doi.org/10.1039/b920150eopenalex-snapshot
Dependence of surface atomic arrangement of titanium dioxide on metallic nanowire nucleation by thermally assisted photoreduction
inferred← citeshttps://doi.org/10.1039/c1ce05317eopenalex-snapshot
Photo-induced nucleation of rutile nanorods—an ignored parameter in crystallization
inferred← citeshttps://doi.org/10.1039/c1jm11763gopenalex-snapshot
Atomic layer deposited HfO2 and HfO2/TiO2 bi-layer films using a heteroleptic Hf-precursor for logic and memory applications
inferred← citeshttps://doi.org/10.1039/c2ee03390aopenalex-snapshot
Photo-induced hydrophilicity and self-cleaning: models and reality
inferred← citeshttps://doi.org/10.1039/c2jm30690eopenalex-snapshot
Epitaxial TiO2/SnO2 core–shell heterostructure by atomic layer deposition
inferred← citeshttps://doi.org/10.1039/c3cc42880jopenalex-snapshot
Room-temperature large magnetic-dielectric coupling in new phase anatase VTiO4
inferred← citeshttps://doi.org/10.1039/c3ta14034bopenalex-snapshot
A review on hybrid nanolaminate materials synthesized by deposition techniques for energy storage applications
inferred← citeshttps://doi.org/10.1039/c3tc30687aopenalex-snapshot
Spectroscopic investigation of the hole states in Ni-deficient NiO films
inferred← citeshttps://doi.org/10.1039/c4tc01381fopenalex-snapshot
Chemistry of active oxygen in RuO x and its influence on the atomic layer deposition of TiO 2 films
inferred← citeshttps://doi.org/10.1039/c5nr03476kopenalex-snapshot
Epitaxial 1D electron transport layers for high-performance perovskite solar cells
inferred← citeshttps://doi.org/10.1039/c6cc07611dopenalex-snapshot
Solution processable formation of a few nanometer thick-disordered overlayer on the surface of open-ended TiO 2 nanotubes
inferred← citeshttps://doi.org/10.1039/c6tc05158hopenalex-snapshot
Process–property relationship in high-k ALD SrTiO 3 and BaTiO 3 : a review
inferred← citeshttps://doi.org/10.1039/c7tc03467aopenalex-snapshot
Ta-Doped SnO 2 as a reduction–resistant oxide electrode for DRAM capacitors
inferred← citeshttps://doi.org/10.1039/c8tc04167aopenalex-snapshot
MoO 2 as a thermally stable oxide electrode for dynamic random-access memory capacitors
inferred← citeshttps://doi.org/10.1039/c9tc05002gopenalex-snapshot
Self energy and excitonic effect in (un)doped TiO 2 anatase: a comparative study of hybrid DFT, GW and BSE to explore optical properties
inferred← citeshttps://doi.org/10.1039/d0cp04176aopenalex-snapshot
Modulation of the adsorption chemistry of a precursor in atomic layer deposition to enhance the growth per cycle of a TiO 2 thin film
inferred← citeshttps://doi.org/10.1039/d0tc01489copenalex-snapshot
Atomic layer deposition of Ru thin films using (2,4-dimethyloxopentadienyl)(ethylcyclopentadienyl)Ru and the effect of ammonia treatment during the deposition
inferred← citeshttps://doi.org/10.1039/d0tc05682kopenalex-snapshot
Atomic layer deposition of a ruthenium thin film using a precursor with enhanced reactivity
inferred← citeshttps://doi.org/10.1039/d1na00563dopenalex-snapshot
Tuning the band gap and carrier concentration of titania films grown by spatial atomic layer deposition: a precursor comparison
inferred← citeshttps://doi.org/10.1039/d2tc00574copenalex-snapshot
Atomic layer deposition of titanium oxide thin films using a titanium precursor with a linked amido-cyclopentadienyl ligand
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