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Real-time optical monitoring of ammonia flow and decomposition kinetics under high-pressure chemical vapor deposition conditions

https://doi.org/10.1116/1.1894422
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What this work says

Outgoing claims: the papers this work cites, builds on, or argues with.

inferredcites →https://doi.org/10.1002/1521-3951(200212)234:3<787::aid-pssb787>3.0.co;2-hopenalex-snapshot
Band Gap of Hexagonal InN and InGaN Alloys
inferredcites →https://doi.org/10.1016/0022-0248(84)90463-9openalex-snapshot
The mechanism of the growth of InP by MOCVD: A flow-tube investigation of the pyrolysis of the indium precursor
inferredcites →https://doi.org/10.1016/0022-0248(89)90144-9openalex-snapshot
In situ measurement of the metalorganic and hydride partial pressures in a MOCVD reactor using ultraviolet absorption spectroscopy
inferredcites →https://doi.org/10.1016/0025-5408(70)90028-0openalex-snapshot
Thermal stability of indium nitride at elevated temperatures and nitrogen pressures
inferredcites →https://doi.org/10.1016/j.matlet.2004.07.011openalex-snapshot
The growth temperature dependence of In aggregation in two-step MOCVD grown InN films on sapphire
inferredcites →https://doi.org/10.1016/s0022-0248(00)00240-2openalex-snapshot
In situ monitoring and control of multicomponent gas-phase streams for growth of GaN via MOCVD
inferredcites →https://doi.org/10.1016/s0022-0248(00)00548-0openalex-snapshot
Initial stages of InN thin film growth onto MgAl2O4(1 1 1) and α-Al2O3(0 0·1) substrates
inferredcites →https://doi.org/10.1016/s0022-0248(00)00986-6openalex-snapshot
InN thin films grown by metalorganic molecular beam epitaxy on sapphire substrates
inferredcites →https://doi.org/10.1016/s0022-0248(02)01814-6openalex-snapshot
Spectroscopic ellipsometry during metalorganic vapor phase epitaxy of InN
inferredcites →https://doi.org/10.1016/s0032-0633(98)00074-9openalex-snapshot
Low and room temperature photoabsorption cross sections of NH3 in the UV region
inferredcites →https://doi.org/10.1016/s0040-6090(01)01754-0openalex-snapshot
High growth rate deposition of oriented hexagonal InN films
inferredcites →https://doi.org/10.1016/s0921-5107(01)00711-5openalex-snapshot
Real-time optical characterization of thin film growth
inferredcites →https://doi.org/10.1016/s0927-0248(02)00273-8openalex-snapshot
Potential PV materials-based InN thin films: fabrication, structural and optical properties
inferredcites →https://doi.org/10.1021/jp0013558openalex-snapshot
Theoretical Study of Indium Compounds of Interest for Organometallic Chemical Vapor Deposition
inferredcites →https://doi.org/10.1021/jp026289jopenalex-snapshot
Semiclassical Calculation of Reaction Rate Constants for Homolytical Dissociation Reactions of Interest in Organometallic Vapor-Phase Epitaxy (OMVPE)
inferredcites →https://doi.org/10.1063/1.1595135openalex-snapshot
Indium nitride (InN): A review on growth, characterization, and properties
inferredcites →https://doi.org/10.1063/1.345644openalex-snapshot
Measurement of atomic indium during metalorganic chemical vapor deposition
inferredcites →https://doi.org/10.1063/1.347219openalex-snapshot
Temperature-dependent ultraviolet absorption spectra of group IIIb and Vb compounds used in photo-assisted chemical vapor deposition
inferredcites →https://doi.org/10.1063/1.463718openalex-snapshot
Spectroscopy and dynamics of jet-cooled hydrazines and ammonia. I. Single-photon absorption and ionization spectra
inferredcites →https://doi.org/10.1116/1.1705589openalex-snapshot
Real time optical characterization of gas flow dynamics in high-pressure chemical vapor deposition
inferredcites →https://doi.org/10.1116/1.577146openalex-snapshot
Kinetics of thermal decomposition of triethylgallium, trimethylgallium, and trimethylindium adsorbed on GaAs(100)
inferredcites →https://doi.org/10.1116/1.588793openalex-snapshot
Thermal stability and desorption of Group III nitrides prepared by metal organic chemical vapor deposition
inferredcites →https://doi.org/10.1557/jmr.2002.0445openalex-snapshot
Thermodynamics and phase stability in the In–N system

What points at this work

Incoming claims: where this work appears in other papers’ reference lists and arguments.

inferred← citeshttps://doi.org/10.2139/ssrn.4198261openalex-extracted
Structural, Compositional, and Thermal Stability Studies on In0.96ga0.04n Epilayers Grown by High Pressure Chemical Vapor Deposition
inferred← citeshttps://doi.org/10.1002/pssb.200562246openalex-snapshot
The characterization of InN growth under high‐pressure CVD conditions
inferred← citeshttps://doi.org/10.1002/pssr.201206309openalex-snapshot
Non‐polar group‐III nitride semiconductor surfaces
inferred← citeshttps://doi.org/10.1007/s11051-012-1048-5openalex-snapshot
Generation of InN nanocrystals in organic solution through laser ablation of high pressure chemical vapor deposition-grown InN thin film
inferred← citeshttps://doi.org/10.1007/s11664-014-3494-6openalex-snapshot
Growth of InN and In-Rich InGaN Layers on GaN Templates by Pulsed Metalorganic Chemical Vapor Deposition
inferred← citeshttps://doi.org/10.1016/j.apsusc.2012.10.184openalex-snapshot
Thermal stability of InN epilayers grown by high pressure chemical vapor deposition
inferred← citeshttps://doi.org/10.1016/j.jcrysgro.2014.04.001openalex-snapshot
Photoluminescence from GaN layers at high temperatures as a candidate for in situ monitoring in MOVPE
inferred← citeshttps://doi.org/10.1016/j.jcrysgro.2020.125574openalex-snapshot
Kinetically stabilized high-temperature InN growth
inferred← citeshttps://doi.org/10.1016/j.jmsy.2018.07.007openalex-snapshot
A novel critical point detection method for mechanical deformation in tightening processes
inferred← citeshttps://doi.org/10.1016/j.mseb.2005.10.032openalex-snapshot
InN growth by high-pressures chemical vapor deposition: Real-time optical growth characterization
inferred← citeshttps://doi.org/10.1016/j.proci.2026.106652openalex-snapshot
Quantitative measurements of hydrogen atom concentrations in ammonia diffusion flames using two-photon absorption laser-induced fluorescence
inferred← citeshttps://doi.org/10.1016/j.susc.2008.02.003openalex-snapshot
Desorption of hydrogen from InN observed by HREELS
inferred← citeshttps://doi.org/10.1039/c4ta06848copenalex-snapshot
UV-assisted synthesis of indium nitride nano and microstructures
inferred← citeshttps://doi.org/10.1063/1.2187513openalex-snapshot
Surface structure, composition, and polarity of indium nitride grown by high-pressure chemical vapor deposition
inferred← citeshttps://doi.org/10.1063/1.2352797openalex-snapshot
Characterization of InN layers grown by high-pressure chemical vapor deposition
inferred← citeshttps://doi.org/10.1063/1.2424649openalex-snapshot
Metal-organic vapor phase epitaxy and properties of AlInN in the whole compositional range
inferred← citeshttps://doi.org/10.1063/5.0061926openalex-snapshot
On the dynamics in chemical vapor deposition of InN
inferred← citeshttps://doi.org/10.1116/1.2908736openalex-snapshot
Optical characterization of InN layers grown by high-pressure chemical vapor deposition
inferred← citeshttps://doi.org/10.1116/1.3596619openalex-snapshot
Observation of NH2 species on tilted InN (011−1) facets
inferred← citeshttps://doi.org/10.1149/1.2816206openalex-snapshot
Homogeneous Decomposition of Trimethylindium in an Inverted, Stagnation-Point Flow Reactor by In Situ Raman Spectroscopy
inferred← citeshttps://doi.org/10.1177/00037028241268260openalex-snapshot
Nondispersive Ultraviolet Visible Gas Analyzer for Monitoring Molybdenum Chloride and Oxychloride Precursors During Vapor Deposition Processes
inferred← citeshttps://doi.org/10.1557/proc-0892-ff06-02openalex-snapshot
Properties of InN grown by High-Pressure CVD
inferred← citeshttps://doi.org/10.21236/ada624591openalex-snapshot
Stabilization of Indium-Rich In1-xGaxN Heterostructures: The Exploration of a Common Processing Window
inferred← citeshttps://doi.org/10.57709/1059808openalex-snapshot
High Pressure Chemical Vapor Deposition: A Novel Approach for the Growth of InN
inferred← citeshttps://doi.org/10.7567/jjap.56.041001openalex-snapshot
Low-temperature (≤600 °C) growth of high-quality In x Ga 1− x N ( x ∼ 0.3) by metalorganic vapor phase epitaxy using NH 3 decomposition catalyst
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