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Dual excitation reactive ion etcher for low energy plasma processing

https://doi.org/10.1116/1.577863
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Thedischarge Characteristics of Dual-Frequency Capacitively Coupled Ar/Ch4 Plasma Diagnostics by Optical Emission Spectroscopy
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Kinetic plasma simulations for three dielectric etchers
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Particle simulation of a magnetized dual-frequency capacitively coupled plasma
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Comparison of etching characteristics of SiO2 with ArF photoresist in C4F6 and C4F8 based dual-frequency superimposed capacitively coupled plasmas
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Effects of CH2F2 and H2 flow rates on process window for infinite etch selectivity of silicon nitride to ArF PR in dual-frequency CH2F2/H2/Ar capacitively coupled plasmas
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Non-linear lumped model circuit of capacitively coupled plasmas at the intermediate radio-frequencies
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Study on the mode transitions for rf power dissipation in capacitively coupled plasma
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Study of high radio frequency plasma discharge effects on carbon fiber using Raman spectroscopy
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Simulation of spatial characteristics of very high frequency hydrogen plasma produced by a balanced power feeding
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Influence of dual-frequency source powers on ion density and electron temperature in capacitively-coupled argon plasma
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Current gain of a pulsed DC discharge in low-pressure gases
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Study of optical emission spectroscopy using modified Boltzmann plot in dual-frequency synchronized pulsed capacitively coupled discharges with DC bias at low-pressure in Ar/O 2 /C 4 F 8 plasma etching process
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Control of Dual Frequency Capacitively Coupled Plasma via blocking capacitor and phase angle
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Functional separation of biasing and sustaining voltages in two-frequency capacitively coupled plasma
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Frequency variation under constant power conditions in hydrogen radio frequency discharges
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Numerical study of Ar/CF4/N2 discharges in single- and dual-frequency capacitively coupled plasma reactors
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Analytic model for a dual frequency capacitive discharge
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Atomic hydrogen densities in capacitively coupled very high-frequency plasmas in H2: Effect of excitation frequency
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Numerical simulation of dual frequency etching reactors: Influence of the external process parameters on the plasma characteristics
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Simulations of dual rf-biased sheaths and ion energy distributions arriving at a dual rf-biased electrode
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Effect of radio-frequency power levels on electron density in a confined two-frequency capacitively-coupled plasma processing tool
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A nonlinear global model of a dual frequency capacitive discharge
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A time-dependent analytical sheath model for dual-frequency capacitively coupled plasma
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A self-consistent hybrid model of a dual frequency sheath: Ion energy and angular distributions
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Capacitively coupled radio-frequency hydrogen discharges: The role of kinetics
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Modulating effects of the low-frequency source on ion energy distributions in a dual frequency capacitively coupled plasma
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Spectroscopic study on rotational and vibrational temperature of N2 and N2+ in dual-frequency capacitively coupled plasma
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Analysis of optical emission spectroscopy in a dual-frequency capacitively coupled CHF3 plasma
inferred← citeshttps://doi.org/10.1063/1.3125303openalex-snapshot
Numerical results for the Ar and CF4 mixture gas in a dual frequency capacitively coupled plasma using a hybrid model
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Experimental investigation of ion energy distributions in a dual frequency capacitively coupled Ar/CF4 plasma
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Numerical simulations of electrical asymmetry effect on electronegative plasmas in capacitively coupled rf discharge
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Numerical study of ion energy and angular distributions in dual-frequency capacitively coupled CF4 plasmas
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Effects of frequency on the two-dimensional structure of capacitively coupled plasma in Ar
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Investigation of radio frequency plasma for the growth of diamond like carbon films
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The electrical asymmetry effect in geometrically asymmetric capacitive radio frequency plasmas
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Spectroscopy diagnostic of dual-frequency capacitively coupled CHF3/Ar plasma
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Heating mode transition in a hybrid direct current/dual-frequency capacitively coupled CF4 discharge
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Development of a high-speed impedance measurement system for dual-frequency capacitive-coupled pulsed-plasma
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Transient plasma potential in pulsed dual frequency inductively coupled plasmas and effect of substrate biasing
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The effect of intermediate frequency on sheath dynamics in collisionless current driven triple frequency capacitive plasmas
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A time-dependent model of pulse-driven radio frequency capacitively coupled collisional plasma sheath
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Influence of excitation frequency on the metastable atoms and electron energy distribution function in a capacitively coupled argon discharge
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Spatial flux and energy asymmetry in a low pressure capacitively coupled plasma discharge excited by sawtooth waveform: A harmonic study
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The effects of magnetic field and negative DC voltage on the capacitive argon discharge
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Effect of gas pressure on plasma asymmetry and higher harmonics generation in sawtooth waveform driven capacitively coupled plasma discharge
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Collisionless magnetized rf sheath resonance heating in dual-frequency capacitively coupled plasmas
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Coupling between the magnetized radio-frequency sheath resonance and the electrical asymmetry effect in magnetized capacitively coupled plasmas
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Negative Ion and Dust Particle-Containing Plasmas
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Analytical model of a dual frequency capacitive sheath
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Modelling of the dual frequency capacitive sheath in the intermediate pressure range
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A simple model of an asymmetric capacitive plasma with dual frequency
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Independent control of ion current and ion impact energy onto electrodes in dual frequency plasma devices
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Particle and fluid simulations of low-temperature plasma discharges: benchmarks and kinetic effects
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Electromagnetic effects in high-frequency capacitive discharges used for plasma processing
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Particle simulation of a magnetically enhanced dual-frequency capacitively coupled plasma
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On the possibility of making a geometrically symmetric RF-CCP discharge electrically asymmetric
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Effect of low-frequency power on dual-frequency capacitively coupled plasmas
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From electron depletion to quasi-neutrality: the sheath–bulk transition in RF modulated discharges
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Effect of power modulation on properties of pulsed capacitively coupled radiofrequency discharges
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Fast, kinetically self-consistent simulation of RF modulated plasma boundary sheaths
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Critical evaluation of analytical models for stochastic heating in dual-frequency capacitive discharges
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Simulations of electromagnetic effects in high-frequency capacitively coupled discharges using the Darwin approximation
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PECVD RF versus dual frequency: an investigation of plasma influence on metal–organic precursors' decomposition and material characteristics
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Investigation of wave emission phenomena in dual frequency capacitive discharges using particle-in-cell simulation
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Investigation of Dual Radio-Frequency Driven Sheaths and Ion Energy Distributions Bombarding an Insulating Substrate
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Comparison between Dual Radio Frequency- and Pulse-Driven Sheath near Insulating Substrates
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Simulation of Dual Frequency Capacitive Sheath over a Concave Electrode in Low Pressure
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One-Dimensional Fluid Model for Dust Particles in Dual-Frequency Capacitively Coupled Silane Discharges
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Electron heating in multiple-frequency capacitive discharges
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Standing wave and skin effects in large-area, high-frequency capacitive discharges
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Electrostatic modelling of dual frequency rf plasma discharges
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Ion energy distribution control in single and dual frequency capacitive plasma sources
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Plasma characteristics of an Ar/CF4/N2discharge in an asymmetric dual frequency reactor: numerical investigation by a PIC/MC model
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Frequency dependent plasma characteristics in a capacitively coupled 300 mm wafer plasma processing chamber
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Negative ions in single and dual frequency capacitively coupled fluorocarbon plasmas
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Nonlinear plasma dynamics in capacitive radio frequency discharges
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Modes of low-pressure dual-frequency (27/2 MHz) discharges in hydrogen
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Nonlinear dynamics of dual frequency capacitive discharges: a global model matched to an experiment
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Dual-frequency capacitive radiofrequency discharges: effect of low-frequency power on electron density and ion flux
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Heating mechanism in direct current superposed single-frequency and dual-frequency capacitively coupled plasmas
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Effects of reactor geometry and frequency coupling on dual-frequency capacitively coupled plasmas
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A current driven capacitively coupled chlorine discharge
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Temporal evolution of electron density in a low pressure pulsed two-frequency (60 MHz/2 MHz) capacitively coupled plasma discharge
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Dual-frequency capacitively coupled chlorine discharge
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Experimental diagnostics of plasma radial uniformity and comparisons with computational simulations in capacitive discharges
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Effect of gas properties on the dynamics of the electrical slope asymmetry effect in capacitive plasmas: comparison of Ar, H2and CF4
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Very high-frequency capacitively coupled argon discharges
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Comparison of 2D Hybrid Simulational and Experimental Results for Dual-Frequency Capacitively Coupled Argon Plasmas
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Investigation of Capacitively Coupled Argon Plasma Driven by Dual-Frequency with Different Frequency Configurations
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Analytical Determination of Collisionless Sheath Properties for Triple Frequency Capacitively Coupled Plasma
inferred← citeshttps://doi.org/10.1088/1361-6463/aa60f7openalex-snapshot
Spatial profiles of interelectrode electron density in direct current superposed dual-frequency capacitively coupled plasmas
inferred← citeshttps://doi.org/10.1088/1361-6463/aa65edopenalex-snapshot
On singlet metastable states, ion flux and ion energy in single and dual frequency capacitively coupled oxygen discharges
inferred← citeshttps://doi.org/10.1088/1361-6463/aa6e42openalex-snapshot
A model for tailored-waveform radiofrequency sheaths
inferred← citeshttps://doi.org/10.1088/1361-6463/ab8a93openalex-snapshot
Investigation of plasma uniformity, rotational and vibrational temperature in a 162 MHz multi-electrode capacitive discharge
inferred← citeshttps://doi.org/10.1088/1361-6463/abc11bopenalex-snapshot
Driving frequency effect on discharge parameters and higher harmonic generation in capacitive discharges at constant power densities
inferred← citeshttps://doi.org/10.1088/1361-6463/ac5da5openalex-snapshot
Plasma asymmetry and electron and ion energy distribution function in capacitive discharges excited by tailored waveforms
inferred← citeshttps://doi.org/10.1088/1361-6463/ac6712openalex-snapshot
Experimental study of transition from electron beam to rf-power-controlled plasma in DFCCP in argon with additional ionization by an electron beam
inferred← citeshttps://doi.org/10.1088/1361-6595/aa6ef1openalex-snapshot
Electrical asymmetry effects in magnetized capacitively coupled plasmas in argon
inferred← citeshttps://doi.org/10.1088/1361-6595/aaa237openalex-snapshot
Relation between the ion flux and plasma density in an rf CCP discharge
inferred← citeshttps://doi.org/10.1088/1361-6595/aaa565openalex-snapshot
Study of dual radio frequency capacitively coupled plasma: an analytical treatment matched to an experiment
inferred← citeshttps://doi.org/10.1088/1361-6595/aab870openalex-snapshot
Plasma characteristics in an electrically asymmetric capacitive discharge sustained by multiple harmonics: operating in the very high frequency regime
inferred← citeshttps://doi.org/10.1088/1361-6595/aac242openalex-snapshot
Experimental investigation of standing wave effect in dual-frequency capacitively coupled argon discharges: role of a low-frequency source
inferred← citeshttps://doi.org/10.1088/1361-6595/aaca8copenalex-snapshot
Effects of secondary electron emission on plasma density and electron excitation dynamics in dual-frequency asymmetric capacitively coupled argon plasmas
inferred← citeshttps://doi.org/10.1088/1361-6595/aae5c3openalex-snapshot
Ion energy and angular distributions in low-pressure capacitive oxygen RF discharges driven by tailored voltage waveforms
inferred← citeshttps://doi.org/10.1088/1361-6595/ab034fopenalex-snapshot
Analytical plasma impedance model of dual frequency capacitive discharges with ion dynamics
inferred← citeshttps://doi.org/10.1088/1361-6595/ab3accopenalex-snapshot
Ion composition of rf CCP in Ar/H 2 mixtures
inferred← citeshttps://doi.org/10.1088/1361-6595/ab6c80openalex-snapshot
Realistic treatment for secondary electron emission in hybrid DC/DF capacitively coupled discharge
inferred← citeshttps://doi.org/10.1088/1361-6595/ab7086openalex-snapshot
Electron and negative ion dynamics in a pulsed 100 MHz capacitive discharge produced in an O 2 and Ar/O 2 /C 4 F 8 gas mixture
inferred← citeshttps://doi.org/10.1088/1361-6595/abbac2openalex-snapshot
High frequency sheath modulation and higher harmonic generation in a low pressure very high frequency capacitively coupled plasma excited by sawtooth waveform
inferred← citeshttps://doi.org/10.1088/1361-6595/abe810openalex-snapshot
Development of high-efficiency capacitive discharge using magnetic resonance wireless power transfer systems
inferred← citeshttps://doi.org/10.1088/1361-6595/abf71bopenalex-snapshot
‘Virtual IED sensor’ for df rf CCP discharges
inferred← citeshttps://doi.org/10.1088/1361-6595/ac4c27openalex-snapshot
Equivalent electric circuit model of accurate ion energy control with tailored waveform biasing
inferred← citeshttps://doi.org/10.1088/1361-6595/ac56c4openalex-snapshot
Enhanced plasma generation in capacitively coupled plasma using a parallel inductor
inferred← citeshttps://doi.org/10.1088/1361-6595/ac6692openalex-snapshot
Striations in dual-low-frequency (2/10 MHz) driven capacitively coupled CF 4 plasmas
inferred← citeshttps://doi.org/10.1088/1361-6595/ac8830openalex-snapshot
Effect of an electron beam on a dual-frequency capacitive rf plasma: experiment and simulation *
inferred← citeshttps://doi.org/10.1088/1361-6595/acce63openalex-snapshot
Benchmarking and validation of a hybrid model for electropositive and electronegative capacitively coupled plasmas
inferred← citeshttps://doi.org/10.1088/1361-6595/ad270eopenalex-snapshot
Hybrid simulation of instabilities in capacitively coupled RF CF4/Ar plasmas driven by a dual frequency source
inferred← citeshttps://doi.org/10.1088/1361-6595/ad3d82openalex-snapshot
Effects of low-frequency voltage on nonlinear standing wave excitation, plasma uniformity, and ion dynamics in dual-frequency asymmetric capacitive discharges
inferred← citeshttps://doi.org/10.1088/1361-6595/ad4587openalex-snapshot
Numerical characterization of capacitively coupled plasma driven by tailored frequency modulated radio frequency source
inferred← citeshttps://doi.org/10.1088/1361-6595/ad5df7openalex-snapshot
Kinetic simulations of capacitively coupled plasmas driven by tailored voltage waveforms with multi-frequency matching
inferred← citeshttps://doi.org/10.1088/1361-6595/ad6587openalex-snapshot
Ozone production by an He+O2 radio-frequency atmospheric pressure plasma jet driven by tailored voltage waveforms
inferred← citeshttps://doi.org/10.1088/1361-6595/ad69c0openalex-snapshot
Energy efficient F atom generation and control in CF4 capacitively coupled plasmas driven by tailored voltage waveforms
inferred← citeshttps://doi.org/10.1088/1361-6595/ad95b9openalex-snapshot
Ar/CF4 capacitively coupled plasma generated using 40 MHz sinusoidal and 800 kHz rectangular waveform voltages
inferred← citeshttps://doi.org/10.1088/1674-1056/20/1/015207openalex-snapshot
Diagnosis of a low pressure capacitively coupled argon plasma by using a simple collisional-radiative model
inferred← citeshttps://doi.org/10.1088/1674-1056/25/11/115202openalex-snapshot
One-dimensional hybrid simulation of the electrical asymmetry effect caused by the fourth-order harmonic in dual-frequency capacitively coupled plasma
inferred← citeshttps://doi.org/10.1088/2058-6272/ace87copenalex-snapshot
Atmospheric pressure pulsed modulated arc discharge plasma
inferred← citeshttps://doi.org/10.1088/2058-6272/ae2fafopenalex-snapshot
Experimental investigation of the dual- frequency effects in helicon plasmas on the PPT device
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Numerical investigation of ion-energy-distribution functions in single and dual frequency capacitively coupled plasma reactors
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Ion energy distribution function in dual-frequency rf capacitively coupled discharges: Analytical model
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Simulation of dust particles in dual-frequency capacitively coupled silane discharges
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ULSI reliability through ultraclean processing
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Analytical modeling of collisionless triple frequency capacitive sheath
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Modeling of a collisional triple frequency capacitively coupled plasma sheath
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Process And Device Innovations Based On Ultra Clean Technology
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50 Years of Reactive Ion Etching in Microelectronics
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Dual radio frequency sources in a magnetized capacitively coupled plasma discharge
inferred← citeshttps://doi.org/10.1109/tps.2007.905201openalex-snapshot
Experimental and Theoretical Study of Ion Energy Distribution Function in Single and Dual Frequency RF Discharges
inferred← citeshttps://doi.org/10.1109/tps.2009.2023849openalex-snapshot
Experimental and Theoretical Studies of Radical Production in RF CCP Discharge at 81-MHz Frequency in $\hbox{Ar/CF}_{4}$ and $\hbox{Ar/CHF}_{3}$ Mixtures
inferred← citeshttps://doi.org/10.1109/tps.2012.2227826openalex-snapshot
A Time-Dependent Collisional Sheath Model for Dual-Frequency Capacitively Coupled RF Plasma
inferred← citeshttps://doi.org/10.1109/tps.2014.2304463openalex-snapshot
Analytical Determination of Collisional Sheath Properties for Triple Frequency Capacitively Coupled Plasma
inferred← citeshttps://doi.org/10.1109/tps.2014.2331337openalex-snapshot
Investigation of Single and Dual RF Capacitively Coupled Nitrogen Plasma Discharges Using Optical Emission Spectroscopy
inferred← citeshttps://doi.org/10.1109/tps.2017.2673781openalex-snapshot
Modeling of Resonant Surface Wave Excitation in a Large CCP Reactor
inferred← citeshttps://doi.org/10.1109/tps.2025.3584260openalex-snapshot
Parameter Dependences of Ion Energy Distribution and Ion Flux in Dual-Frequency Capacitively Coupled Argon Discharges
inferred← citeshttps://doi.org/10.1109/tps.2025.3597102openalex-snapshot
Automatic Numerical Impedance Matching of Single-Frequency Capacitively Coupled Plasmas in Carbon Tetrafluoride
inferred← citeshttps://doi.org/10.1116/1.2009770openalex-snapshot
Effect of high-frequency variation on the etch characteristics of ArF photoresist and silicon nitride layers in dual frequency superimposed capacitively coupled plasma
inferred← citeshttps://doi.org/10.1116/1.2201059openalex-snapshot
Effect of different frequency combination on ArF photoresist deformation and silicon dioxide etching in the dual frequency superimposed capacitively coupled plasmas
inferred← citeshttps://doi.org/10.1116/1.2353844openalex-snapshot
Inductively coupled plasma etching of amorphous Al2O3 and TiO2 mask layers grown by atomic layer deposition
inferred← citeshttps://doi.org/10.1116/1.2771558openalex-snapshot
Modeling of magnetically enhanced capacitively coupled plasma sources: Two frequency discharges
inferred← citeshttps://doi.org/10.1116/1.3179162openalex-snapshot
Measurement of electron temperatures and electron energy distribution functions in dual frequency capacitively coupled CF4/O2 plasmas using trace rare gases optical emission spectroscopy
inferred← citeshttps://doi.org/10.1116/1.3520644openalex-snapshot
Spatially resolved measurements of ion density and electron temperature in a dual-frequency capacitively coupled plasma by complete floating double probe technique
inferred← citeshttps://doi.org/10.1116/1.4804136openalex-snapshot
Effect of bias application to plasma density in weakly magnetized inductively coupled plasma
inferred← citeshttps://doi.org/10.1116/1.4897914openalex-snapshot
Plasma dynamics in a discharge produced by a pulsed dual frequency inductively coupled plasma source
inferred← citeshttps://doi.org/10.1116/1.4906819openalex-snapshot
Modeling and experimental investigation of the plasma uniformity in CF4/O2 capacitively coupled plasmas, operating in single frequency and dual frequency regime
inferred← citeshttps://doi.org/10.1116/1.4943384openalex-snapshot
Ion energy control in reactive ion etching using 1-MHz pulsed-DC square-wave-superimposed 100-MHz RF capacitively coupled plasma
inferred← citeshttps://doi.org/10.1116/1.4959844openalex-snapshot
Electron density modulation in a pulsed dual-frequency (2/13.56 MHz) dual-antenna inductively coupled plasma discharge
inferred← citeshttps://doi.org/10.1116/1.5133978openalex-snapshot
Effect of low frequency power on the electron energy distribution function in argon inductively coupled plasmas
inferred← citeshttps://doi.org/10.1116/1.581324openalex-snapshot
Dually driven radio frequency plasma simulation with a three moment model
inferred← citeshttps://doi.org/10.1116/1.581989openalex-snapshot
Two-dimensional CT images of two-frequency capacitively coupled plasma
inferred← citeshttps://doi.org/10.1116/5.0094293openalex-snapshot
Electron density and temperature of dual-frequency capacitively coupled argon plasma in two-dimensional distribution obtained and studied in experiment
inferred← citeshttps://doi.org/10.1116/6.0001732openalex-snapshot
Effect of low frequency voltage waveform on plasma uniformity in a dual-frequency capacitively coupled plasma
inferred← citeshttps://doi.org/10.1116/6.0002242openalex-snapshot
Control of the ion flux and energy distribution of dual-frequency capacitive RF plasmas by the variation of the driving voltages
inferred← citeshttps://doi.org/10.1116/6.0004221openalex-snapshot
Influence of collision processes in the sheath on ion energy distribution functions in radio frequency discharges
inferred← citeshttps://doi.org/10.1134/s1063780x20120028openalex-snapshot
Features of Electromagnetic Field Excitation in a Capacitive HF Discharge. I. General Aspects. A Simple Model of Symmetric Discharge
inferred← citeshttps://doi.org/10.1134/s1063780x21330011openalex-snapshot
A Time-Dependent Model of Pulse-Modulated Dual Radio Frequency Capacitively Coupled Plasma Sheath
inferred← citeshttps://doi.org/10.1143/jjap.37.2035openalex-snapshot
Variation of Radial Plasma Density Profile with the Excitation Frequency in a Magnetron-Type Plasma
inferred← citeshttps://doi.org/10.1143/jjap.37.6193openalex-snapshot
Magnetically Enhanced Dual Frequency Capacitively Coupled Plasma Source for Large-area Wafer Processing
inferred← citeshttps://doi.org/10.1143/jjap.44.5856openalex-snapshot
ArF Photoresist Deformation in Dual Frequency Superimposed Capacitively Coupled Plasma (DFS-CCP) with Different Frequency Combinations
inferred← citeshttps://doi.org/10.1143/jjap.45.5203openalex-snapshot
Non-Neutral/Quasi-Neutral Plasma Edge Definition for Discharge Models: A Numerical Example for Dual Frequency Hydrogen Capacitively Coupled Plasmas
inferred← citeshttps://doi.org/10.1143/jjap.45.8151openalex-snapshot
Analysis of a Capacitively Coupled Dual-Frequency CF 4 Discharge
inferred← citeshttps://doi.org/10.1143/jjap.47.7005openalex-snapshot
Sustainment of Plasma Density by a Low Magnetic Field in a Dual-Frequency Capacitively Coupled Plasma
inferred← citeshttps://doi.org/10.1201/9781420017656-4openalex-snapshot
Methods/Principles of Deposition and Etching of Thin Films
inferred← citeshttps://doi.org/10.1201/9781420017656.ch1openalex-snapshot
Methods/Principles of Deposition and Etching of Thin Films
inferred← citeshttps://doi.org/10.1209/0295-5075/80/25001openalex-snapshot
Low-pressure gas breakdown in dual-frequency RF electric fields in nitrogen
inferred← citeshttps://doi.org/10.1585/jspf.81.85openalex-snapshot
Meter-Scale Large-Area Plasma Sources for Next-Generation Processes
inferred← citeshttps://doi.org/10.4028/www.scientific.net/amr.26-28.185openalex-snapshot
Attempt to Control Spatial Distribution of Nano-Gold Particles Using Nanoporous Surfaces of FeAl Single Crystal
inferred← citeshttps://doi.org/10.4028/www.scientific.net/msf.512.239openalex-snapshot
Design of Automatic Matching System for Very High Frequency Plasma-Enhanced Processes
inferred← citeshttps://doi.org/10.4139/sfj.56.268openalex-snapshot
inferred← citeshttps://doi.org/10.70675/bc3d7d27z6e73z4f85z8734zc9f4e624055aopenalex-snapshot
Caractérisation et optimisation d'une source plasma pour le traitement de semences dans le domaine agroalimentaire
inferred← citeshttps://doi.org/10.70675/bcfa9daaz0ab2z4f9ez9bcazd1774e5848e9openalex-snapshot
Gravure de titane pour applications biomédicales
inferred← citeshttps://doi.org/10.70675/e3daf089zf8d3z4fd1zb946z9784959a7249openalex-snapshot
Area selective deposition of microcrystalline silicon by PECVD : physical origin, challenges and solutions.
inferred← citeshttps://doi.org/10.7498/aps.61.015204openalex-snapshot
Radial density uniformity of dual frequency capacitively coupled plasma
inferred← citeshttps://doi.org/10.7498/aps.69.20191864openalex-snapshot
Diagnosis of capacitively coupled plasma driven by pulse-modulated 27.12 MHz by using an emissive probe
inferred← citeshttps://doi.org/10.7498/aps.74.20250244openalex-snapshot
Discharge characteristics of dual-frequency magnetized capacitively coupled Ar/CH4 plasma
inferred← citeshttps://doi.org/10.7567/jjap.55.06hb03openalex-snapshot
Generation of obliquely incident ions using phase-shifted RF voltages applied on rod electrodes
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