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The Discharge Characteristics of Dual-Frequency Capacitively Coupled Ar/Ch4 Plasma Diagnostics by Optical Emission Spectroscopy
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Contribution of Ion Energy and Flux on High-Aspect Ratio SiO2 Etching Characteristics in a Dual-Frequency Capacitively Coupled Ar/C4F8 Plasma: Individual Ion Energy and Flux Controlled
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