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Hygroscopic fluorine‐doped silicon oxide thin‐film‐based large‐area three‐layered moisture barrier using a roll‐to‐roll microwave plasma‐enhanced chemical vapor deposition system
Environmental reliability and moisture barrier properties of silicon nitride and silicon oxide films using roll-to-roll plasma enhanced chemical vapor deposition
Decoupling Moisture and Hydrogen Barrier Properties in Silicon Nitride Films Deposited by Plasma-Enhanced Atomic Layer Deposition at 100 °C via Precursor-Defined Bonding Networks
Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200 °C
Homogeneous Al2O3 Multilayered Films Deposited on Poly(ethylene terephthalate) by Facing-Target Sputtering System for Thin-Film Passivation of Organic Light-Emitting Diodes
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