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Atomic Layer Deposition of Hafnium Dioxide Films from 1-Methoxy-2-methyl-2-propanolate Complex of Hafnium
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What this work says
Outgoing claims: the papers this work cites, builds on, or argues with.
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Chemical vapour deposition of the oxides of titanium, zirconium and hafnium for use as high-k materials in microelectronic devices. A carbon-free precursor for the synthesis of hafnium dioxide
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Low-Temperature Deposition of Zirconium Oxide-Based Nanocrystalline Films by Alternate Supply of Zr[OC(CH3)3]4 and H2O
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Novel Mononuclear Alkoxide Precursors for the MOCVD of ZrO2 and HfO2 Thin Films
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Atomic Layer Deposition of Hafnium Dioxide Films from Hafnium Tetrakis(ethylmethylamide) and Water
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Volatile Metal Alkoxides according to the Concept of Donor Functionalization
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Hafnia and hafnia-toughened ceramics
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Thin films of metal oxides on silicon by chemical vapor deposition with organometallic compounds. I
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Optical determination of the film thicknesses in multilayer thin film structures
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Development of crystallinity and morphology in hafnium dioxide thin films grown by atomic layer epitaxy
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Effect of water dose on the atomic layer deposition rate of oxide thin films
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Thin film atomic layer deposition equipment for semiconductor processing
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Comparison of hafnium oxide films grown by atomic layer deposition from iodide and chloride precursors
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Analysis of AlN thin films by combining TOF-ERDA and NRB techniques
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Influence of substrate temperature on atomic layer growth and properties of HfO2 thin films
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Ultrathin high-K metal oxides on silicon: processing, characterization and integration issues
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Vapor Deposition of Metal Oxides and Silicates: Possible Gate Insulators for Future Microelectronics
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Metal alkoxides as precursors for electronic and ceramic materials
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Novel mononuclear zirconium and hafnium alkoxides; improved precursors for the MOCVD of ZrO2 and HfO2
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Molecular design of improved precursors for the MOCVD of electroceramic oxides
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HfO 2 and ZrO 2 alternative gate dielectrics for silicon devices by liquid injection chemical vapour deposition
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Physical and electrical characterization of Hafnium oxide and Hafnium silicate sputtered films
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Thermodynamic stability of high- K dielectric metal oxides ZrO2 and HfO2 in contact with Si and SiO2
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Thermal stability and structural characteristics of HfO2 films on Si (100) grown by atomic-layer deposition
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Chemical interaction between atomic-layer-deposited HfO2 thin films and the Si substrate
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Effect of Annealing Conditions on a Hafnium Oxide Reinforced SiO[sub 2] Gate Dielectric Deposited by Plasma-Enhanced Metallorganic CVD
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Atomic Layer Deposition of Hafnium Oxide Using Anhydrous Hafnium Nitrate
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Deposition of HfO[sub 2] Thin Films in HfI[sub 4]-Based Processes
What points at this work
Incoming claims: where this work appears in other papers’ reference lists and arguments.
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Amidoxime-Containing Zr and Hf Precursors for Thin Film Deposition
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Artificial Intelligence for Fluorite Ferroelectric Materials: From Discovery to Optimization
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Non‐Aqueous Routes to Metal Oxide Thin Films by Atomic Layer Deposition
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DISORDERED STRUCTURE AND DENSITY OF GAP STATES IN HIGH-PERMITTIVITY THIN SOLID FILMS
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Hafnia sol-gel films synthesized from HfCl4: Changes of structure and properties with the firing temperature
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The Cut-Off Phenomenon Effect on ZrO2 Growth Using Remote Plasma-Enhanced Atomic Layer Deposition
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Evaluation of a Praseodymium Precursor for Atomic Layer Deposition of Oxide Dielectric Films
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Atomic Layer Deposition of HfO2 Using Alkoxides as Precursors
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Some recent developments in the MOCVD and ALD of high-κ dielectric oxides
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