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Direct Bandgap Group IV Epitaxy on Si for Laser Applications

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What this work says

Outgoing claims: the papers this work cites, builds on, or argues with.

inferredcites →https://doi.org/10.1007/s11664-014-3089-2openalex-snapshot
Material Characterization of Ge1−x Sn x Alloys Grown by a Commercial CVD System for Optoelectronic Device Applications
inferredcites →https://doi.org/10.1016/j.jcrysgro.2005.06.036openalex-snapshot
High germanium content SiGe virtual substrates grown at high temperatures
inferredcites →https://doi.org/10.1016/j.jcrysgro.2012.12.014openalex-snapshot
Material characterization of high Sn-content, compressively-strained GeSn epitaxial films after rapid thermal processing
inferredcites →https://doi.org/10.1016/j.tsf.2008.08.068openalex-snapshot
Tensile strained Ge layers on strain-relaxed Ge1−Sn /virtual Ge substrates
inferredcites →https://doi.org/10.1016/j.tsf.2011.10.114openalex-snapshot
Growth of silicon based germanium tin alloys
inferredcites →https://doi.org/10.1016/j.tsf.2013.10.064openalex-snapshot
Epitaxial growth of strained and unstrained GeSn alloys up to 25% Sn
inferredcites →https://doi.org/10.1016/j.tsf.2013.10.078openalex-snapshot
SiGeSn growth studies using reduced pressure chemical vapor deposition towards optoelectronic applications
inferredcites →https://doi.org/10.1021/cg401652fopenalex-snapshot
Cubic Phase Sn-Rich GeSn Nanocrystals in a Ge Matrix
inferredcites →https://doi.org/10.1021/cm502988yopenalex-snapshot
Advances in Light Emission from Group-IV Alloys via Lattice Engineering and n-Type Doping Based on Custom-Designed Chemistries
inferredcites →https://doi.org/10.1021/ja00381a054openalex-snapshot
Germanium-hydrogen bond strengths in germanes
inferredcites →https://doi.org/10.1021/jp993985jopenalex-snapshot
Thermal Decomposition of Tin Tetrachloride Based on Cl- and Sn-Concentration Measurements
inferredcites →https://doi.org/10.1038/nphoton.2013.67openalex-snapshot
Analysis of enhanced light emission from highly strained germanium microbridges
inferredcites →https://doi.org/10.1038/nphoton.2014.321openalex-snapshot
Lasing in direct-bandgap GeSn alloy grown on Si
inferredcites →https://doi.org/10.1038/nphoton.2015.1openalex-snapshot
The rise of the GeSn laser
inferredcites →https://doi.org/10.1063/1.1571223openalex-snapshot
Optical gain in materials with indirect transitions
inferredcites →https://doi.org/10.1063/1.1743083openalex-snapshot
Germanium Solidus Curves
inferredcites →https://doi.org/10.1063/1.1848188openalex-snapshot
Sn-mediated Ge∕Ge(001) growth by low-temperature molecular-beam epitaxy: Surface smoothening and enhanced epitaxial thickness
inferredcites →https://doi.org/10.1063/1.3367978openalex-snapshot
Magnetic and structural characterization of thiol capped ferromagnetic Ag nanoparticles
inferredcites →https://doi.org/10.1063/1.3415530openalex-snapshot
Strain tensors in layer systems by precision ion channeling measurements
inferredcites →https://doi.org/10.1063/1.3658632openalex-snapshot
Increased photoluminescence of strain-reduced, high-Sn composition Ge1−xSnx alloys grown by molecular beam epitaxy
inferredcites →https://doi.org/10.1063/1.4767381openalex-snapshot
Electronic band structure and effective mass parameters of Ge1-xSnx alloys
inferredcites →https://doi.org/10.1063/1.4772781openalex-snapshot
Strain analysis in SiN/Ge microstructures obtained via Si-complementary metal oxide semiconductor compatible approach
inferredcites →https://doi.org/10.1063/1.4803927openalex-snapshot
Temperature-dependent photoluminescence of Ge/Si and Ge1-ySny/Si, indicating possible indirect-to-direct bandgap transition at lower Sn content
inferredcites →https://doi.org/10.1063/1.4829360openalex-snapshot
Tensely strained GeSn alloys as optical gain media
inferredcites →https://doi.org/10.1073/pnas.1107968108openalex-snapshot
Direct-bandgap light-emitting germanium in tensilely strained nanomembranes
inferredcites →https://doi.org/10.1088/0022-3727/46/6/065103openalex-snapshot
Optical gain of germanium infrared lasers on different crystal orientations
inferredcites →https://doi.org/10.1088/0268-1242/24/5/055002openalex-snapshot
Epitaxial growth of Ge thick layers on nominal and 6° off Si(0 0 1); Ge surface passivation by Si
inferredcites →https://doi.org/10.1103/physrevb.41.11992openalex-snapshot
Eight-band k ⋅ p model of strained zinc-blende crystals
inferredcites →https://doi.org/10.1103/physrevb.46.9913openalex-snapshot
Erratum: Eight-bandk⋅pmodel of strained zinc-blende crystals [Phys. Rev. B41, 11 992 (1990)]
inferredcites →https://doi.org/10.1103/physrevb.67.125322openalex-snapshot
Mechanism for epitaxial breakdown during low-temperature Ge(001) molecular beam epitaxy
inferredcites →https://doi.org/10.1103/physrevb.87.235313openalex-snapshot
Radiative recombination and optical gain spectra in biaxially strained n -type germanium
inferredcites →https://doi.org/10.1103/physrevlett.109.057402openalex-snapshot
Direct-Gap Gain and Optical Absorption in Germanium Correlated to the Density of Photoexcited Carriers, Doping, and Strain
inferredcites →https://doi.org/10.1103/physrevlett.66.2903openalex-snapshot
Anomalous strain relaxation in SiGe thin films and superlattices
inferredcites →https://doi.org/10.1109/3.661466openalex-snapshot
Theoretical model for intravalley and intervalley free-carrier absorption in semiconductor lasers: beyond the classical Drude model
inferredcites →https://doi.org/10.1109/jlt.2008.923643openalex-snapshot
Vector Finite Difference Modesolver for Anisotropic Dielectric Waveguides
inferredcites →https://doi.org/10.1109/jqe.2010.2059000openalex-snapshot
Strain-Balanced ${\rm Ge}_{z}{\rm Sn}_{1-z}\hbox{--}{\rm Si}_{x}{\rm Ge}_{y}{\rm Sn}_{1-x-y}$ Multiple-Quantum-Well Lasers
inferredcites →https://doi.org/10.1116/1.586204openalex-snapshot
Relaxed GexSi1−x structures for III–V integration with Si and high mobility two-dimensional electron gases in Si
inferredcites →https://doi.org/10.1149/2.011304jssopenalex-snapshot
Crystalline Properties and Strain Relaxation Mechanism of CVD Grown GeSn
inferredcites →https://doi.org/10.1364/oe.15.011272openalex-snapshot
Tensile-strained, n-type Ge as a gain medium for monolithic laser integration on Si
inferredcites →https://doi.org/10.1364/oe.19.025866openalex-snapshot
Strained germanium thin film membrane on silicon substrate for optoelectronics
inferredcites →https://doi.org/10.1364/prj.2.0000a8openalex-snapshot
Direct bandgap germanium-on-silicon inferred from 57% 〈100〉 uniaxial tensile strain [Invited]

What points at this work

Incoming claims: where this work appears in other papers’ reference lists and arguments.

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Sputtering-Grown Intrinsic Gesn/Ge Multiple Quantum Wells on N-Ge for Low-Cost Visible/Shortwave Infrared Dual-Band Photodetection
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Group IV Alloys for Advanced Nano‐ and Optoelectronic Applications
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High Sn‐Content GeSn Light Emitters for Silicon Photonics
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All‐Group IV Transferable Membrane Mid‐Infrared Photodetectors
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Adaptive Epitaxy of C‐Si‐Ge‐Sn: Customizable Bulk and Quantum Structures
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Room Temperature Lasing in GeSn Microdisks Enabled by Strain Engineering
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GeSn Quantum Wells for Room‐Temperature Mid‐Infrared Lasing on Si and on Insulator Platforms
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Advanced GeSn/SiGeSn Group IV Heterostructure Lasers
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Enhancing Device Performance with High Electron Mobility GeSn Materials
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High Mobility and Electrostatics in GeSn Quantum Wells With SiGeSn Barriers
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Growth of Ge1−xSnx Nanowires by Chemical Vapor Deposition via Vapor–Liquid–Solid Mechanism Using GeH4 and SnCl4
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Spin Pumping in Epitaxial Ge 1‐x Sn x Alloys
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SiGeSn Ternaries for Efficient Group IV Heterostructure Light Emitters
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Lasing in Group-IV Materials
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Si–Ge–Sn alloys grown by chemical vapour deposition: a versatile material for photonics, electronics, and thermoelectrics
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Structural and Optical Characteristics of GeSn Quantum Wells for Silicon-Based Mid-Infrared Optoelectronic Applications
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GePb Alloy Growth Using Layer Inversion Method
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Waveguide platforms for mid-wave IR sensing
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Group IV Nanowires for Carbon-Free Energy Conversion
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Photovoltage spectroscopy of direct and indirect bandgaps of strained Ge1-xSnx thin films on a Ge/Si(001) substrate
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PECVD Processing of low bandgap-energy amorphous hydrogenated germanium-tin (a-GeSn:H) films for opto-electronic applications
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Effective strain relaxation of GeSn single crystal with Sn content of 16.5% on Ge grown by high-temperature sputtering
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Sputtering-grown undoped GeSn/Ge multiple quantum wells on n-Ge for low-cost visible/shortwave infrared dual-band photodetection
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Growth of single-crystalline GeSn films with high-Sn content on InP substrates by sputtering and rapid thermal annealing
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Magnetron sputtering growth and growth mechanism of GeSn films with Sn content exceeding 25% on InP substrates
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Enhanced photoluminescence of GeSn by strain relaxation and spontaneous carrier confinement through rapid thermal annealing
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Study of low-defect and strain-relaxed GeSn growth via reduced pressure CVD in H2 and N2 carrier gas
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Impact of thickness on the structural properties of high tin content GeSn layers
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Study of strain evolution mechanism in Ge1−xSnx materials grown by low temperature molecular beam epitaxy
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Growth defects in GeSn/Ge/Si(001) epitaxial layers grown by hot wire chemical vapor deposition of Ge with co-evaporation of Sn
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The Transition of Growth Behaviors of Moderate Sn Fraction Ge1-Xsnx (8%<X<15%) Epilayers with Low Temperature Molecular Beam Epitaxy
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Systematic investigation of photoluminescence characteristics in GeSn films with varied Sn content by high-resolution and wide-spectrum system
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Elastically strained GeSiSn layers and GeSiSn islands in multilayered periodical structures
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Fundamentals of Ge 1−x Sn x and Si y Ge 1−x-y Sn x RPCVD epitaxy
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Sn composition and Si-cap passivation effects on infrared detection performance of p-Ge1−xSnx/n-Ge photodiode
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Coupling of coherent misfit strain and composition distributions in core–shell Ge/Ge1-xSnx nanowire light emitters
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Temperature and doping-dependent interplay between the direct and indirect optical response in buffer-mediated epitaxial germanium
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Si–Ge–Sn alloys: From growth to applications
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Engineering strain relaxation of GeSn epilayers on Ge/Si(001) substrates
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Process modules for GeSn nanoelectronics with high Sn-contents
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Epitaxy of Si-Ge-Sn-based heterostructures for CMOS-integratable light emitters
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Low contact resistance of NiGeSn on n-GeSn
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Investigation of hydrogen inductively coupled plasma treatment effect for Ge0.938Sn0.062/Ge/Si film using photoreflectance spectroscopy
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Spectroscopic review of hydrogenated, carbonated and oxygenated group IV alloys
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Strain Relaxation and Relative Defect Density with Thickness in MBE-Grown Ge 0.85 Sn 0.15 on Ge(001)
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Pushing the Composition Limit of Anisotropic Ge1–xSnx Nanostructures and Determination of Their Thermal Stability
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Metastable Group IV Allotropes and Solid Solutions: Nanoparticles and Nanowires
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Insights into the Origins of Guided Microtrenches and Microholes/rings from Sn Segregation in Germanium–Tin Epilayers
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Combined Iodine- and Sulfur-Based Treatments for an Effective Passivation of GeSn Surface
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Design of Dipole-Allowed Direct Band Gaps in Ge/Sn Core–Shell Nanowires
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Growth and Optical Properties of Direct Band Gap Ge/Ge 0.87 Sn 0.13 Core/Shell Nanowire Arrays
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Design, Theoretical, and Experimental Investigation of Tensile-Strained Germanium Quantum-Well Laser Structure
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Isothermal Heteroepitaxy of Ge1–xSnx Structures for Electronic and Photonic Applications
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Thermoelectric Efficiency of Epitaxial GeSn Alloys for Integrated Si-Based Applications: Assessing the Lattice Thermal Conductivity by Raman Thermometry
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Room Temperature Lattice Thermal Conductivity of GeSn Alloys
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Open Electrochemical Liquid Phase Epitaxial Growth of Crystalline Ge Films
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Low Temperature Deposition of High-k/Metal Gate Stacks on High-Sn Content (Si)GeSn-Alloys
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Fabricating Metallic Circuit Patterns on Polymer Substrates through Laser and Selective Metallization
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Correlation of Bandgap Reduction with Inversion Response in (Si)GeSn/High-k/Metal Stacks
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Critical Factors in the Growth of Hyperdoped Germanium Microwires by Electrochemical Liquid–Liquid–Solid Method
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Probing Lattice Dynamics and Electronic Resonances in Hexagonal Ge and Si x Ge1– x Alloys in Nanowires by Raman Spectroscopy
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Room-Temperature Lasing from Monolithically Integrated GaAs Microdisks on Silicon
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Epitaxial Ge 0.81 Sn 0.19 Nanowires for Nanoscale Mid-Infrared Emitters
inferred← citeshttps://doi.org/10.1021/acsnano.9b09929openalex-snapshot
Kinetic Control of Morphology and Composition in Ge/GeSn Core/Shell Nanowires
inferred← citeshttps://doi.org/10.1021/acsphotonics.1c00617openalex-snapshot
CMOS-Compatible Bias-Tunable Dual-Band Detector Based on GeSn/Ge/Si Coupled Photodiodes
inferred← citeshttps://doi.org/10.1021/acsphotonics.4c00033openalex-snapshot
Continuous-Wave GeSn Light-Emitting Diodes on Silicon with 2.5 μm Room-Temperature Emission
inferred← citeshttps://doi.org/10.1021/acsphotonics.5b00372openalex-snapshot
Optical Transitions in Direct-Bandgap Ge1–xSnx Alloys
inferred← citeshttps://doi.org/10.1021/acsphotonics.6b00258openalex-snapshot
Optically Pumped GeSn Microdisk Lasers on Si
inferred← citeshttps://doi.org/10.1021/acsphotonics.8b01116openalex-snapshot
GeSn/SiGeSn Heterostructure and Multi Quantum Well Lasers
inferred← citeshttps://doi.org/10.1021/acsphotonics.8b01678openalex-snapshot
Electrically Injected GeSn Vertical-Cavity Surface Emitters on Silicon-on-Insulator Platforms
inferred← citeshttps://doi.org/10.1038/s41377-021-00675-7openalex-snapshot
GeSnOI mid-infrared laser technology
inferred← citeshttps://doi.org/10.1038/s41566-020-0601-5openalex-snapshot
Ultra-low-threshold continuous-wave and pulsed lasing in tensile-strained GeSn alloys
inferred← citeshttps://doi.org/10.1038/s41598-018-24018-6openalex-snapshot
Investigation of GeSn Strain Relaxation and Spontaneous Composition Gradient for Low-Defect and High-Sn Alloy Growth
inferred← citeshttps://doi.org/10.1038/s41598-018-33820-1openalex-snapshot
Investigation of carrier confinement in direct bandgap GeSn/SiGeSn 2D and 0D heterostructures
inferred← citeshttps://doi.org/10.1038/s41598-018-36837-8openalex-snapshot
Impact of tensile strain on low Sn content GeSn lasing
inferred← citeshttps://doi.org/10.1038/s41598-019-40146-zopenalex-snapshot
Strain engineering of transverse electric and transverse magnetic mode of material gain in GeSn/SiGeSn quantum wells
inferred← citeshttps://doi.org/10.1038/s41598-025-89005-0openalex-snapshot
The indirect L-valleys splitting inductive optical gain variation of $$\hbox {Ge}_{1-x}\hbox {Sn}_{x}$$ nanowires caused by [110] direction uniaxial stress
inferred← citeshttps://doi.org/10.1038/s43246-025-00934-9openalex-snapshot
GeSn quantum wells as a platform for spin-resolved hole transport
inferred← citeshttps://doi.org/10.1038/srep34030openalex-snapshot
Large area Germanium Tin nanometer optical film coatings on highly flexible aluminum substrates
inferred← citeshttps://doi.org/10.1038/srep34082openalex-snapshot
Material gain engineering in GeSn/Ge quantum wells integrated with an Si platform
inferred← citeshttps://doi.org/10.1039/c7nr09568fopenalex-snapshot
Critical strain for Sn incorporation into spontaneously graded Ge/GeSn core/shell nanowires
inferred← citeshttps://doi.org/10.1039/d3tc01018jopenalex-snapshot
Lattice matched GeSn/InAlAs heterostructure: role of Sn in energy band alignment, atomic layer diffusion and photoluminescence
inferred← citeshttps://doi.org/10.1039/d5nr01090jopenalex-snapshot
Tip-induced nanoscale engineering of surface potential and conductivity in GeSn alloys
inferred← citeshttps://doi.org/10.1063/1.4938476openalex-snapshot
Etching of germanium-tin using ammonia peroxide mixture
inferred← citeshttps://doi.org/10.1063/1.4956439openalex-snapshot
Direct gap Ge1-ySny alloys: Fabrication and design of mid-IR photodiodes
inferred← citeshttps://doi.org/10.1063/1.4978512openalex-snapshot
Raman spectral shift versus strain and composition in GeSn layers with 6%–15% Sn content
inferred← citeshttps://doi.org/10.1063/1.4984117openalex-snapshot
Schottky barrier tuning via dopant segregation in NiGeSn-GeSn contacts
inferred← citeshttps://doi.org/10.1063/1.5036728openalex-snapshot
The thermal stability of epitaxial GeSn layers
inferred← citeshttps://doi.org/10.1063/1.5038644openalex-snapshot
Atomically uniform Sn-rich GeSn semiconductors with 3.0–3.5 μm room-temperature optical emission
inferred← citeshttps://doi.org/10.1063/1.5048683openalex-snapshot
Defect evaluation in strain-relaxed Ge0.947Sn0.053 grown on (001) Si
inferred← citeshttps://doi.org/10.1063/1.5050273openalex-snapshot
Enhanced Sn incorporation in GeSn epitaxial semiconductors via strain relaxation
inferred← citeshttps://doi.org/10.1063/5.0120505openalex-snapshot
Micrometer-thick, atomically random Si0.06Ge0.90Sn0.04 for silicon-integrated infrared optoelectronics
inferred← citeshttps://doi.org/10.1063/5.0172330openalex-snapshot
Growth of tin-free germanium carbon alloys using carbon tetrabromide (CBr4)
inferred← citeshttps://doi.org/10.1063/5.0196334openalex-snapshot
The structural, electronic, optical, and mechanical properties of carbon-based halides: An ab initio DFT approach
inferred← citeshttps://doi.org/10.1063/5.0301383openalex-snapshot
Local constrained expansion induced surface tensile strain and optical enhancement in suspended GeSn microstructures
inferred← citeshttps://doi.org/10.1063/5.0308927openalex-snapshot
Determination of composition, strain, and layer thickness of germanium-tin superlattices using x-ray diffraction
inferred← citeshttps://doi.org/10.1063/5.0336288openalex-snapshot
Dual-barrier GeSn quantum-well lasers with operation up to 150 K
inferred← citeshttps://doi.org/10.1088/1361-6463/abae94openalex-snapshot
Impact of ex-situ annealing on strain and composition of MBE grown GeSn
inferred← citeshttps://doi.org/10.1088/1361-6463/acaf39openalex-snapshot
Secondary epitaxy of high Sn fraction GeSn layer on strain-relaxed GeSn virtue substrate by molecular beam epitaxy
inferred← citeshttps://doi.org/10.1088/1361-6463/acd4cbopenalex-snapshot
Harvesting strong photoluminescence of physical vapor deposited GeSn with record high deposition temperature
inferred← citeshttps://doi.org/10.1088/1361-6463/ad58ebopenalex-snapshot
Design of tensile-strained GeSn/SiGeSn structure for low threshold mid-infrared laser application
inferred← citeshttps://doi.org/10.1088/1361-6463/add273openalex-snapshot
MBE growth and characterization of strained GeSn/Ge multiple quantum well structures
inferred← citeshttps://doi.org/10.1088/1361-6463/ae6b99openalex-snapshot
Tunable direct bandgap photoluminescence of GeSn grown on Ge/Si(100) substrate by molecular beam epitaxy growth
inferred← citeshttps://doi.org/10.1088/1361-6528/aaac45openalex-snapshot
Pseudomorphic GeSiSn, SiSn and Ge layers in strained heterostructures
inferred← citeshttps://doi.org/10.1088/1361-6528/ab99f6openalex-snapshot
Impact of droplet composition on the nucleation rate and morphology of vapor-liquid-solid GeSn nanowires
inferred← citeshttps://doi.org/10.1088/1361-6641/aa8084openalex-snapshot
Growth and structural properties of step-graded, high Sn content GeSn layers on Ge
inferred← citeshttps://doi.org/10.1088/1361-6641/aae2f9openalex-snapshot
Epitaxial GeSn: impact of process conditions on material quality
inferred← citeshttps://doi.org/10.1088/1361-6641/aaea32openalex-snapshot
Growth and characterization of SiGeSn pseudomorphic layers on 200 mm Ge virtual substrates
inferred← citeshttps://doi.org/10.1088/1361-6641/ad14eeopenalex-snapshot
Epitaxial growth of high-quality Ge layers on Si with Ge2H6 under UHV-CVD conditions
inferred← citeshttps://doi.org/10.1088/1674-1056/26/11/116802openalex-snapshot
Formation of high-Sn content polycrystalline GeSn films by pulsed laser annealing on co-sputtered amorphous GeSn on Ge substrate
inferred← citeshttps://doi.org/10.1088/1674-1056/26/12/127402openalex-snapshot
A hybrid functional first-principles study on the band structure of non-strained Ge 1− x Sn x alloys
inferred← citeshttps://doi.org/10.1088/1742-6596/1482/1/012016openalex-snapshot
Structure and surface morphology of GeSn/Si(001) layers grown by HW CVD with co-evaporation of Sn
inferred← citeshttps://doi.org/10.1103/physrevapplied.15.014034openalex-snapshot
Extended Short-Wave Infrared Absorption in Group-IV Nanowire Arrays
inferred← citeshttps://doi.org/10.1103/physrevapplied.15.024031openalex-snapshot
Midinfrared Emission and Absorption in Strained and Relaxed Direct-Band-Gap Ge 1 − x Sn x Semiconductors
inferred← citeshttps://doi.org/10.1103/physrevmaterials.4.033604openalex-snapshot
Thermally activated diffusion and lattice relaxation in (Si)GeSn materials
inferred← citeshttps://doi.org/10.1109/group4.2017.8082173openalex-snapshot
Reduced threshold microdisk lasers from GeSn/SiGeSn heterostructures
inferred← citeshttps://doi.org/10.1109/iedm.2015.7409615openalex-snapshot
Direct bandgap GeSn microdisk lasers at 2.5 μm for monolithic integration on Si-platform
inferred← citeshttps://doi.org/10.1109/iedm.2016.7838472openalex-snapshot
GeSn lasers for CMOS integration
inferred← citeshttps://doi.org/10.1109/jsen.2021.3074407openalex-snapshot
Simulation of High-Efficiency Resonant-Cavity-Enhanced GeSn Single-Photon Avalanche Photodiodes for Sensing and Optical Quantum Applications
inferred← citeshttps://doi.org/10.1109/jstqe.2024.3430060openalex-snapshot
Electrically Injected Mid-Infrared GeSn Laser on Si Operating at 140 K
inferred← citeshttps://doi.org/10.1109/jstqe.2024.3489712openalex-snapshot
Electrically Pumped GeSn Micro-Ring Lasers
inferred← citeshttps://doi.org/10.1109/ted.2017.2742957openalex-snapshot
Fabrication, Characterization, and Analysis of Ge/GeSn Heterojunction p-Type Tunnel Transistors
inferred← citeshttps://doi.org/10.1109/ulis.2016.7440043openalex-snapshot
Process modules for GeSn nanoelectronics with high Sn-contents
inferred← citeshttps://doi.org/10.1116/1.4990773openalex-snapshot
Comparison study of the low temperature growth of dilute GeSn and Ge
inferred← citeshttps://doi.org/10.1116/1.5047909openalex-snapshot
TEOS layers for low temperature processing of group IV optoelectronic devices
inferred← citeshttps://doi.org/10.1116/6.0001253openalex-snapshot
Gas source molecular epitaxy of Ge1−ySny materials and devices using high order Ge4H10 and Ge5H12 hydrides
inferred← citeshttps://doi.org/10.1116/6.0002052openalex-snapshot
Synthesis of short-wave infrared Ge1−ySny semiconductors directly on Si(100) via ultralow temperature molecular routes for monolithic integration applications
inferred← citeshttps://doi.org/10.1116/6.0003734openalex-snapshot
Development of aspect ratio trapping growth of GeSn on Si for midwave infrared applications
inferred← citeshttps://doi.org/10.1116/6.0003798openalex-snapshot
Development of GeSn epitaxial films with strong direct bandgap luminescence in the mid-wave infrared region using a commercial chemical vapor deposition reactor
inferred← citeshttps://doi.org/10.1116/6.0005407openalex-snapshot
STM and ARPES characterization of quality of GeSn grown on Ge(001) for atomic ordering investigations
inferred← citeshttps://doi.org/10.1117/12.2211641openalex-snapshot
Direct bandgap GeSn light emitting diodes for short-wave infrared applications grown on Si
inferred← citeshttps://doi.org/10.1117/12.2227573openalex-snapshot
(Si)GeSn nanostructures for light emitters
inferred← citeshttps://doi.org/10.1149/2.0061604jssopenalex-snapshot
Saturation Photo-Voltage Methodology for Semiconductor/Insulator Interface Trap Spectroscopy
inferred← citeshttps://doi.org/10.1149/2162-8777/ab80afopenalex-snapshot
PECVD Growth of Composition Graded SiGeSn Thin Films as Novel Approach to Limit Tin Segregation
inferred← citeshttps://doi.org/10.1149/2162-8777/abaeb2openalex-snapshot
Growth of SiGeSn Thin Films Using Simplified PECVD Reactor towards NIR Sensor Devices
inferred← citeshttps://doi.org/10.1149/2162-8777/adcc4fopenalex-snapshot
Gas Phase Reactions Determined by In Situ Mass Spectrometric Investigation for GeSn Chemical Vapor Deposition Processes
inferred← citeshttps://doi.org/10.1186/s11671-017-2429-6openalex-snapshot
Morphology, Structure, and Optical Properties of Semiconductor Films with GeSiSn Nanoislands and Strained Layers
inferred← citeshttps://doi.org/10.1364/oe.24.001358openalex-snapshot
Study of GeSn based heterostructures: towards optimized group IV MQW LEDs
inferred← citeshttps://doi.org/10.1364/oe.416450openalex-snapshot
Rare-earth doped micro-emitters made by lift-off processing in pulsed laser deposited layers on Si substrate
inferred← citeshttps://doi.org/10.1364/ol.43.004558openalex-snapshot
Optically pumped lasing at 3 μm from compositionally graded GeSn with tin up to 223%
inferred← citeshttps://doi.org/10.1364/ol.529590openalex-snapshot
Low-cost and efficient all group-IV visible/shortwave infrared dual-band photodetector
inferred← citeshttps://doi.org/10.1364/ome.8.003220openalex-snapshot
Crystalline GeSn growth by plasma enhanced chemical vapor deposition
inferred← citeshttps://doi.org/10.1364/prj.385096openalex-snapshot
Carrier lifetime of GeSn measured by spectrally resolved picosecond photoluminescence spectroscopy
inferred← citeshttps://doi.org/10.1515/nanoph-2022-0489openalex-snapshot
Scalable fabrication of self‐assembled GeSn vertical nanowires for nanophotonic applications
inferred← citeshttps://doi.org/10.17073/1609-3577-2017-1-38-44openalex-snapshot
MULTILAYERED PERIODICAL STRUCTURES WITH ELASTICALLY STRAINED GESISN LAYERS AND GESISN NANOISLANDS
inferred← citeshttps://doi.org/10.2139/ssrn.5717406openalex-snapshot
Systematic investigation of photoluminescence characteristics in GeSn films with varied Sn content by high-solution and wide-spectrum system
inferred← citeshttps://doi.org/10.32657/10356/137192openalex-snapshot
GeSn alloys fabricated by modified sputtering deposition
inferred← citeshttps://doi.org/10.32657/10356/171485openalex-snapshot
Investigation of micro- and nano-scale germanium-tin light sources towards realizing photonic-integrated circuits
inferred← citeshttps://doi.org/10.3390/coatings13020453openalex-snapshot
Effect of Laser Pulse Width and Intensity Distribution on the Crystallographic Characteristics of GeSn Film
inferred← citeshttps://doi.org/10.3390/cryst16040262openalex-snapshot
Temperature-Dependent Sn Incorporation and Defect Formation in Pseudomorphic SiSn Layers on Si (001) via Molecular Beam Epitaxy
inferred← citeshttps://doi.org/10.3390/ma13163645openalex-snapshot
Structural Property Study for GeSn Thin Films
inferred← citeshttps://doi.org/10.3390/ma14247637openalex-snapshot
Growth of Pseudomorphic GeSn at Low Pressure with Sn Composition of 16.7%
inferred← citeshttps://doi.org/10.3390/nano11102556openalex-snapshot
Review of Si-Based GeSn CVD Growth and Optoelectronic Applications
inferred← citeshttps://doi.org/10.35848/1347-4065/adaba3openalex-snapshot
SiGe epitaxial growth using screen printing of Al–Ge paste on Si followed by pulsed laser annealing
inferred← citeshttps://doi.org/10.7567/1347-4065/aaec1aopenalex-snapshot
Influence of Sn precursors on Ge 1− x Sn x growth using metal-organic chemical vapor deposition
inferred← citeshttps://doi.org/10.7567/jjap.57.03db01openalex-snapshot
Performance of four-terminal low-temperature polycrystalline-silicon thin-film transistors and their application in CMOS inverters on glass substrates
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